Resistive switching mechanism of thin films grown by atomic-layer deposition BJ Choi, DS Jeong, SK Kim, C Rohde, S Choi, JH Oh, HJ Kim, CS Hwang, ... Journal of applied physics 98 (3), 033715, 2005 | 1286 | 2005 |
High dielectric constant thin films on a Ru electrode grown at 250 °C by atomic-layer deposition SK Kim, WD Kim, KM Kim, CS Hwang, J Jeong Applied Physics Letters 85 (18), 4112-4114, 2004 | 348 | 2004 |
Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors SK Kim, GJ Choi, SY Lee, M Seo, SW Lee, JH Han, HS Ahn, S Han, ... Advanced Materials 20 (8), 1429-1435, 2008 | 293 | 2008 |
First-principles study of point defects in rutile E Cho, S Han, HS Ahn, KR Lee, SK Kim, CS Hwang Physical Review B 73 (19), 193202, 2006 | 251 | 2006 |
Capacitors with an equivalent oxide thickness of< 0.5 nm for nanoscale electronic semiconductor memory SK Kim, SW Lee, JH Han, B Lee, S Han, CS Hwang Advanced Functional Materials 20 (18), 2989-3003, 2010 | 195 | 2010 |
Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant SK Kim, CS Hwang, SHK Park, SJ Yun Thin Solid Films 478 (1-2), 103-108, 2005 | 177 | 2005 |
Low temperature (< 100 C) deposition of aluminum oxide thin films by ALD with O3 as oxidant SK Kim, SW Lee, CS Hwang, YS Min, JY Won, J Jeong Journal of The Electrochemical Society 153 (5), F69, 2006 | 168 | 2006 |
Erratum to: Atomic Layer Deposition for Semiconductors CS Hwang Atomic Layer Deposition for Semiconductors, E1-E1, 2014 | 152 | 2014 |
Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ... Chemistry of Materials 23 (8), 2227-2236, 2011 | 116 | 2011 |
Atomic layer deposition of Ru thin films using 2, 4-(dimethylpentadienyl)(ethylcyclopentadienyl) Ru by a liquid injection system SK Kim, SY Lee, SW Lee, GW Hwang, CS Hwang, JW Lee, J Jeong Journal of The Electrochemical Society 154 (2), D95, 2007 | 110 | 2007 |
Wafer-scale growth of MoS 2 thin films by atomic layer deposition JJ Pyeon, SH Kim, DS Jeong, SH Baek, CY Kang, JS Kim, SK Kim Nanoscale 8 (20), 10792-10798, 2016 | 108 | 2016 |
Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions R Soni, A Petraru, P Meuffels, O Vavra, M Ziegler, SK Kim, DS Jeong, ... Nature communications 5 (1), 1-10, 2014 | 98 | 2014 |
Plasma-enhanced atomic layer deposition of TiO2 and Al-doped TiO2 films using N2O and O2 reactants GJ Choi, SK Kim, SJ Won, HJ Kim, CS Hwang Journal of the Electrochemical Society 156 (9), G138, 2009 | 98 | 2009 |
Growth characteristics of atomic layer deposited TiO2 thin films on Ru and Si electrodes for memory capacitor applications WD Kim, GW Hwang, OS Kwon, SK Kim, M Cho, DS Jeong, SW Lee, ... Journal of The Electrochemical Society 152 (8), C552, 2005 | 84 | 2005 |
Atomic-layer-deposited thin films with thin layers grown by in situ oxidation SK Kim, CS Hwang Journal of applied physics 96 (4), 2323-2329, 2004 | 83 | 2004 |
Chemically conformal ALD of SrTiO3 thin films using conventional metallorganic precursors OS Kwon, SK Kim, M Cho, CS Hwang, J Jeong Journal of the Electrochemical Society 152 (4), C229, 2005 | 80 | 2005 |
Titanium dioxide thin films for next-generation memory devices SK Kim, KM Kim, DS Jeong, W Jeon, KJ Yoon, CS Hwang Journal of Materials Research 28 (3), 313, 2013 | 79 | 2013 |
Transformation of the crystalline structure of an ALD TiO2 film on a Ru electrode by O3 pretreatment SK Kim, GW Hwang, WD Kim, CS Hwang Electrochemical and Solid State Letters 9 (1), F5, 2005 | 78 | 2005 |
Growth Behavior of Al-Doped TiO2 Thin Films by Atomic Layer Deposition SK Kim, GJ Choi, JH Kim, CS Hwang Chemistry of Materials 20 (11), 3723-3727, 2008 | 74 | 2008 |
Investigation on the growth initiation of Ru thin films by atomic layer deposition SK Kim, JH Han, GH Kim, CS Hwang Chemistry of Materials 22 (9), 2850-2856, 2010 | 69 | 2010 |