Sensing Behavior of Atomically Thin-Layered MoS2 Transistors DJ Late, YK Huang, B Liu, J Acharya, SN Shirodkar, J Luo, A Yan, ... ACS nano 7 (6), 4879-4891, 2013 | 1320 | 2013 |
Electronic structure, phonons, and thermal properties of ScN, ZrN, and HfN: A first-principles study B Saha, J Acharya, TD Sands, UV Waghmare Journal of Applied Physics 107 (3), 2010 | 167 | 2010 |
Controlling Dielectric and Relaxor-Ferroelectric Properties for Energy Storage by Tuning Pb0.92La0.08Zr0.52Ti0.48O3 Film Thickness E Brown, C Ma, J Acharya, B Ma, J Wu, J Li ACS applied materials & interfaces 6 (24), 22417-22422, 2014 | 75 | 2014 |
Probing the Dielectric Properties of Ultrathin Al/Al2O3/Al Trilayers Fabricated Using in Situ Sputtering and Atomic Layer Deposition J Acharya, J Wilt, B Liu, J Wu ACS applied materials & interfaces 10 (3), 3112-3120, 2018 | 66 | 2018 |
ACS Nano 7, 4879 (2013) DJ Late, YK Huang, B Liu, J Acharya, SN Shirodkar, J Luo, A Yan, ... Crossref, ISI, 2014 | 47 | 2014 |
Highly Stable Three Lithium Insertion in Thin V2O5 Shells on Vertically Aligned Carbon Nanofiber Arrays for Ultrahigh‐Capacity Lithium Ion Battery Cathodes E Brown, J Acharya, GP Pandey, J Wu, J Li Advanced Materials Interfaces 3 (23), 1600824, 2016 | 37 | 2016 |
In situ atomic layer deposition and electron tunneling characterization of monolayer Al2O3 on Fe for magnetic tunnel junctions J Wilt, R Goul, J Acharya, R Sakidja, JZ Wu AIP Advances 8 (12), 2018 | 22 | 2018 |
Effect of Al2O3 Seed-Layer on the Dielectric and Electrical Properties of Ultrathin MgO Films Fabricated Using In Situ Atomic Layer Deposition J Acharya, R Goul, D Romine, R Sakidja, J Wu ACS applied materials & interfaces 11 (33), 30368-30375, 2019 | 16 | 2019 |
Electron tunneling properties of Al2O3 tunnel barrier made using atomic layer deposition in multilayer devices R Goul, J Wilt, J Acharya, B Liu, D Ewing, M Casper, A Stramel, A Elliot, ... AIP Advances 9 (2), 2019 | 13 | 2019 |
Probing the origin of light-enhanced ion diffusion in halide perovskites AD Marshall, J Acharya, G Alkhalifah, B Kattel, WL Chan, JZ Wu ACS Applied Materials & Interfaces 13 (28), 33609-33617, 2021 | 11 | 2021 |
Probing effect of temperature on energy storage properties of relaxor-ferroelectric epitaxial Pb0. 92La0. 08Zr0. 52Ti0. 48O3 thin film capacitors J Acharya, C Ma, E Brown, J Li, J Wu Thin Solid Films 616, 711-716, 2016 | 11 | 2016 |
In vacuo atomic layer deposition and electron tunneling characterization of ultrathin dielectric films for metal/insulator/metal tunnel junctions JZ Wu, J Acharya, R Goul Journal of Vacuum Science & Technology A 38 (4), 2020 | 10 | 2020 |
High Tunneling Magnetoresistance in Magnetic Tunnel Junctions with Subnanometer Thick Al2O3 Tunnel Barriers Fabricated Using Atomic Layer Deposition J Acharya, R Goul, J Wu ACS Applied Materials & Interfaces 13 (13), 15738-15745, 2020 | 9 | 2020 |
Disordered Bilayered V2O5 ⋅ nH2O Shells Deposited on Vertically Aligned Carbon Nanofiber Arrays as Stable High‐Capacity Sodium Ion Battery Cathodes ⋅ E Brown, J Acharya, A Elangovan, GP Pandey, J Wu, J Li Energy Technology 6 (12), 2438-2449, 2018 | 9 | 2018 |
Switching On/Off negative capacitance in ultrathin ferroelectric/dielectric capacitors J Acharya, R Goul, J Wilt, J Wu ACS applied materials & interfaces 12 (8), 9902-9908, 2020 | 5 | 2020 |
Lithium Ion Batteries: Highly Stable Three Lithium Insertion in Thin V2O5 Shells on Vertically Aligned Carbon Nanofiber Arrays for Ultrahigh‐Capacity Lithium Ion … E Brown, J Acharya, GP Pandey, J Wu, J Li Advanced Materials Interfaces 3 (23), 2016 | 3 | 2016 |
Atomic layer deposition of ultrathin tunnel barriers JZ Wu, J Wilt, R Goul, J Acharya US Patent 10,593,871, 2020 | | 2020 |
Reactive MD simulation on the formation of amorphous sub-nano alumina layer Y Lu, D Romine, J Acharya, J Wu, R Sakidja Bulletin of the American Physical Society 65, 2020 | | 2020 |
High Tunneling Magnetoresistance in Magnetic Tunnel Junctions with Subnanometer Thick Al₂O₃ Tunnel Barriers Fabricated Using Atomic Layer Deposition J Acharya, R Goul, J Wu | | 2020 |
Controlling Interface for Metal-Insulator-Metal Architectures with Ultrathin Dielectric Fabricated Using Atomic Layer Deposition and Sputtering J Acharya University of Kansas, 2019 | | 2019 |