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Jagaran Acharya
Jagaran Acharya
Graduate student, University of Kansas
Verified email at ku.edu
Title
Cited by
Cited by
Year
Sensing Behavior of Atomically Thin-Layered MoS2 Transistors
DJ Late, YK Huang, B Liu, J Acharya, SN Shirodkar, J Luo, A Yan, ...
ACS nano 7 (6), 4879-4891, 2013
13192013
Electronic structure, phonons, and thermal properties of ScN, ZrN, and HfN: A first-principles study
B Saha, J Acharya, TD Sands, UV Waghmare
Journal of Applied Physics 107 (3), 2010
1672010
Controlling Dielectric and Relaxor-Ferroelectric Properties for Energy Storage by Tuning Pb0.92La0.08Zr0.52Ti0.48O3 Film Thickness
E Brown, C Ma, J Acharya, B Ma, J Wu, J Li
ACS applied materials & interfaces 6 (24), 22417-22422, 2014
752014
Probing the Dielectric Properties of Ultrathin Al/Al2O3/Al Trilayers Fabricated Using in Situ Sputtering and Atomic Layer Deposition
J Acharya, J Wilt, B Liu, J Wu
ACS applied materials & interfaces 10 (3), 3112-3120, 2018
662018
ACS Nano 7, 4879 (2013)
DJ Late, YK Huang, B Liu, J Acharya, SN Shirodkar, J Luo, A Yan, ...
Crossref, ISI, 2014
472014
Highly Stable Three Lithium Insertion in Thin V2O5 Shells on Vertically Aligned Carbon Nanofiber Arrays for Ultrahigh‐Capacity Lithium Ion Battery Cathodes
E Brown, J Acharya, GP Pandey, J Wu, J Li
Advanced Materials Interfaces 3 (23), 1600824, 2016
372016
In situ atomic layer deposition and electron tunneling characterization of monolayer Al2O3 on Fe for magnetic tunnel junctions
J Wilt, R Goul, J Acharya, R Sakidja, JZ Wu
AIP Advances 8 (12), 2018
212018
Effect of Al2O3 Seed-Layer on the Dielectric and Electrical Properties of Ultrathin MgO Films Fabricated Using In Situ Atomic Layer Deposition
J Acharya, R Goul, D Romine, R Sakidja, J Wu
ACS applied materials & interfaces 11 (33), 30368-30375, 2019
162019
Electron tunneling properties of Al2O3 tunnel barrier made using atomic layer deposition in multilayer devices
R Goul, J Wilt, J Acharya, B Liu, D Ewing, M Casper, A Stramel, A Elliot, ...
AIP Advances 9 (2), 2019
132019
Probing the origin of light-enhanced ion diffusion in halide perovskites
AD Marshall, J Acharya, G Alkhalifah, B Kattel, WL Chan, JZ Wu
ACS Applied Materials & Interfaces 13 (28), 33609-33617, 2021
122021
Probing effect of temperature on energy storage properties of relaxor-ferroelectric epitaxial Pb0. 92La0. 08Zr0. 52Ti0. 48O3 thin film capacitors
J Acharya, C Ma, E Brown, J Li, J Wu
Thin Solid Films 616, 711-716, 2016
112016
In vacuo atomic layer deposition and electron tunneling characterization of ultrathin dielectric films for metal/insulator/metal tunnel junctions
JZ Wu, J Acharya, R Goul
Journal of Vacuum Science & Technology A 38 (4), 2020
102020
High Tunneling Magnetoresistance in Magnetic Tunnel Junctions with Subnanometer Thick Al2O3 Tunnel Barriers Fabricated Using Atomic Layer Deposition
J Acharya, R Goul, J Wu
ACS Applied Materials & Interfaces 13 (13), 15738-15745, 2020
92020
Disordered Bilayered V2O5 ⋅ nH2O Shells Deposited on Vertically Aligned Carbon Nanofiber Arrays as Stable High‐Capacity Sodium Ion Battery Cathodes ⋅
E Brown, J Acharya, A Elangovan, GP Pandey, J Wu, J Li
Energy Technology 6 (12), 2438-2449, 2018
92018
Switching On/Off negative capacitance in ultrathin ferroelectric/dielectric capacitors
J Acharya, R Goul, J Wilt, J Wu
ACS applied materials & interfaces 12 (8), 9902-9908, 2020
52020
Lithium Ion Batteries: Highly Stable Three Lithium Insertion in Thin V2O5 Shells on Vertically Aligned Carbon Nanofiber Arrays for Ultrahigh‐Capacity Lithium Ion …
E Brown, J Acharya, GP Pandey, J Wu, J Li
Advanced Materials Interfaces 3 (23), 2016
32016
Atomic layer deposition of ultrathin tunnel barriers
JZ Wu, J Wilt, R Goul, J Acharya
US Patent 10,593,871, 2020
2020
Reactive MD simulation on the formation of amorphous sub-nano alumina layer
Y Lu, D Romine, J Acharya, J Wu, R Sakidja
Bulletin of the American Physical Society 65, 2020
2020
High Tunneling Magnetoresistance in Magnetic Tunnel Junctions with Subnanometer Thick Al₂O₃ Tunnel Barriers Fabricated Using Atomic Layer Deposition
J Acharya, R Goul, J Wu
2020
Controlling Interface for Metal-Insulator-Metal Architectures with Ultrathin Dielectric Fabricated Using Atomic Layer Deposition and Sputtering
J Acharya
University of Kansas, 2019
2019
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