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Seunghoe Choe
Seunghoe Choe
Tech University of Korea
Verified email at tukorea.ac.kr
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Cited by
Cited by
Year
Electrodeposited Ag catalysts for the electrochemical reduction of CO2 to CO
YS Ham, S Choe, MJ Kim, T Lim, SK Kim, JJ Kim
Applied Catalysis B: Environmental 208, 35-43, 2017
1422017
Electrodeposited IrO2/Ti electrodes as durable and cost-effective anodes in high-temperature polymer-membrane-electrolyte water electrolyzers
S Choe, BS Lee, MK Cho, HJ Kim, D Henkensmeier, SJ Yoo, JY Kim, ...
Applied Catalysis B: Environmental 226, 289-294, 2018
822018
Factors in electrode fabrication for performance enhancement of anion exchange membrane water electrolysis
MK Cho, HY Park, S Choe, SJ Yoo, JY Kim, HJ Kim, D Henkensmeier, ...
Journal of Power Sources 347, 283-290, 2017
662017
Galvanostatic bottom-up filling of TSV-like trenches: Choline-based leveler containing two quaternary ammoniums
MJ Kim, Y Seo, HC Kim, Y Lee, S Choe, YG Kim, SK Cho, JJ Kim
Electrochimica Acta 163, 174-181, 2015
602015
Cu bottom-up filling for through silicon vias with growing surface established by the modulation of leveler and suppressor
MJ Kim, HC Kim, S Choe, JY Cho, D Lee, I Jung, WS Cho, JJ Kim
Journal of the Electrochemical Society 160 (12), D3221, 2013
562013
Degradation of bis (3-sulfopropyl) disulfide and its influence on copper electrodeposition for feature filling
S Choe, MJ Kim, HC Kim, SK Cho, SH Ahn, SK Kim, JJ Kim
Journal of The Electrochemical Society 160 (12), D3179, 2013
542013
An extremely low Pt loading cathode for a highly efficient proton exchange membrane water electrolyzer
H Kim, S Choe, H Park, JH Jang, SH Ahn, SK Kim
Nanoscale 9 (48), 19045-19049, 2017
432017
Bottom-up filling of through silicon vias using galvanostatic Cu electrodeposition with the modified organic additives
HC Kim, S Choe, JY Cho, D Lee, I Jung, WS Cho, MJ Kim, JJ Kim
Journal of The Electrochemical Society 162 (3), D109, 2014
332014
Electrodeposition of High-Surface-Area IrO2 Films on Ti Felt as an Efficient Catalyst for the Oxygen Evolution Reaction
YJ Park, J Lee, YS Park, J Yang, MJ Jang, J Jeong, S Choe, JW Lee, ...
Frontiers in Chemistry 8, 593272, 2020
302020
Electrochemical behavior of citric acid and its influence on Cu electrodeposition for damascene metallization
MJ Kim, S Choe, HC Kim, SK Cho, SK Kim, JJ Kim
Journal of The Electrochemical Society 162 (8), D354, 2015
252015
Direct fabrication of gas diffusion cathode by pulse electrodeposition for proton exchange membrane water electrolysis
H Park, S Choe, H Kim, DK Kim, GH Cho, YS Park, JH Jang, DH Ha, ...
Applied Surface Science 444, 303-311, 2018
242018
Degradation of poly (ethylene glycol–propylene glycol) copolymer and its influences on copper electrodeposition
S Choe, MJ Kim, HC Kim, T Lim, KJ Park, KH Kim, SH Ahn, A Lee, SK Kim, ...
Journal of Electroanalytical Chemistry 714, 85-91, 2014
242014
Electrodeposition of Cu Films with Low Resistivity and Improved Hardness Using Additive Derivatization
HC Kim, MJ Kim, S Choe, T Lim, KJ Park, KH Kim, SH Ahn, SK Kim, ...
Journal of The Electrochemical Society 161 (14), D749, 2014
192014
Decomposition of polyethylene glycol (PEG) at Cu cathode and insoluble anode during Cu electrodeposition
TY Kim, S Choe, JJ Kim
Electrochimica Acta 357, 136803, 2020
182020
Seed repair by electrodeposition in pyrophosphate solution for acid Cu superfilling
S Choe, MJ Kim, HC Kim, T Lim, KJ Park, SK Cho, SK Kim, JJ Kim
Journal of The Electrochemical Society 160 (4), D202, 2013
182013
High strength Cu foil without self-annealing prepared by 2M5S-PEG-SPS
A Lee, MJ Kim, S Choe, JJ Kim
Korean Journal of Chemical Engineering 36, 981-987, 2019
162019
High accuracy concentration analysis of accelerator components in acidic Cu superfilling bath
S Choe, MJ Kim, KH Kim, HC Kim, Y Jeon, TY Kim, SK Kim, JJ Kim
Journal of The Electrochemical Society 163 (2), D33, 2015
162015
Selective determination of PEG-PPG concentration in Cu plating bath with cyclic voltammetry stripping using iodide ion
Y Yoon, H Kim, TY Kim, KH Lee, S Choe, JJ Kim
Electrochimica Acta 339, 135916, 2020
142020
Electrodeposition of Cu-Ag films in ammonia-based electrolyte
Y Jeon, S Choe, HC Kim, MJ Kim, JJ Kim
Journal of Alloys and Compounds 775, 639-646, 2019
142019
BOTTOM-UP FILLing of TSV-scaled trenches by using step current electrodeposition
HC Kim, MJ Kim, Y Seo, Y Lee, S Choe, YG Kim, SK Cho, JJ Kim
ECS Electrochemistry Letters 4 (10), D31, 2015
142015
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