Jaime W. DuMont
Jaime W. DuMont
Verified email at colorado.edu
Title
Cited by
Cited by
Year
Atomic layer etching of HfO2 using sequential, self-limiting thermal reactions with Sn (acac) 2 and HF
Y Lee, JW DuMont, SM George
ECS Journal of Solid State Science and Technology 4 (6), N5013, 2015
762015
Thermal Atomic Layer Etching of SiO2 by a “Conversion-Etch” Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride
JW DuMont, AE Marquardt, AM Cano, SM George
ACS applied materials & interfaces 9 (11), 10296-10307, 2017
672017
Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions
Y Lee, JW DuMont, SM George
Chemistry of Materials 28 (9), 2994-3003, 2016
652016
Mechanism of Thermal Al2O3 Atomic Layer Etching Using Sequential Reactions with Sn(acac)2 and HF
Y Lee, JW DuMont, SM George
Chemistry of Materials 27 (10), 3648-3657, 2015
552015
Atomic Layer Deposition of AlF3 Using Trimethylaluminum and Hydrogen Fluoride
Y Lee, JW DuMont, AS Cavanagh, SM George
The Journal of Physical Chemistry C 119 (25), 14185-14194, 2015
502015
Pyrolysis of alucone molecular layer deposition films studied using in situ transmission Fourier transform infrared spectroscopy
JW DuMont, SM George
The Journal of Physical Chemistry C 119 (26), 14603-14612, 2015
382015
Atomic Layer Etching of AlF3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride
Y Lee, JW DuMont, SM George
The Journal of Physical Chemistry C 119 (45), 25385-25393, 2015
342015
Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride
JW DuMont, SM George
The Journal of chemical physics 146 (5), 052819, 2017
322017
Effect of HF Pressure on Thermal Al2O3 Atomic Layer Etch Rates and Al2O3 Fluorination
AM Cano, AE Marquardt, JW DuMont, SM George
The Journal of Physical Chemistry C 123 (16), 10346-10355, 2019
202019
Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor
DJ Higgs, JW DuMont, K Sharma, SM George
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 36 (1 …, 2018
152018
Atomic Layer Etching (ALE) using sequential thermal reactions: Atomic Layer Deposition (ALD) in reverse
S George, Y Lee, J DuMont, N Johnson, D Zywotko
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 253, 2017
32017
In Situ Infrared Spectroscopic Studies of Molecular Layer Deposition and Atomic Layer Etching Processes
JW DuMont
Graduate Thesis, University of Colorado Boulder, 2016
12016
Atomic Layer Etching Using Thermal Reactions: Atomic Layer Deposition in Reverse
Y Lee, JW DuMont, SM George
ECS Transactions 69 (7), 233, 2015
12015
Enhancement of thermal atomic layer etching
SMC George, NR Johnson, JW Dumont, AE Marquardt, Y Lee, ...
US Patent 10,787,744, 2020
2020
Effect of HF Pressure on Thermal Al₂O₃ Atomic Layer Etch Rates and Al₂O₃ Fluorination
AM Cano, AE Marquardt, JW DuMont, SM George
Journal of physical chemistry, 2019
2019
Spatial Molecular Layer Deposition Tool for Polyamide Thin Films
DJ Higgs, JW DuMont, K Sharma, AM Cano, SM George
SPATIAL ATOMIC AND MOLECULAR LAYER DEPOSITION FOR FLEXIBLE BARRIER …, 2016
2016
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