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Robert Joseph Davis
Robert Joseph Davis
Retired, formerly Director, Nanotech West Lab, The Ohio State University
No verified email - Homepage
Title
Cited by
Cited by
Year
Design, fabrication, and measurement of high-sensitivity piezoelectric microelectromechanical systems accelerometers
LP Wang, RA Wolf Jr, Y Wang, KK Deng, L Zou, RJ Davis, ...
Microelectromechanical Systems, Journal of 12 (4), 433-439, 2003
1802003
High efficiency and low threshold current strained V‐groove quantum‐wire lasers
S Tiwari, GD Pettit, KR Milkove, F Legoues, RJ Davis, JM Woodall
Applied physics letters 64 (26), 3536-3538, 1994
1171994
Microelectromechanical systems (MEMS) accelerometers using lead zirconate titanate thick films
LP Wang, K Deng, L Zou, R Wolf, RJ Davis, S Trolier-McKinstry
IEEE Electron Device Letters 23 (4), 182-184, 2002
722002
Design and construction of a∼ 7× low-concentration photovoltaic system based on compound parabolic concentrators
MA Schuetz, KA Shell, SA Brown, GS Reinbolt, RH French, RJ Davis
IEEE journal of photovoltaics 2 (3), 382-386, 2012
522012
Wet-etch patterning of lead zirconate titanate (PZT) thick films for microelectromechanical systems (MEMS) applications
LP Wang, R Wolf, Q Zhou, S Trolier-McKinstry, RJ Davis
MRS Online Proceedings Library (OPL) 657, EE5. 39, 2000
492000
Image potentials and the dry etching of submicron trenches with low‐energy ions
RJ Davis
Applied physics letters 59 (14), 1717-1719, 1991
301991
Photoluminescence detection of impurities introduced in silicon by dry etching processes
J Weber, RJ Davis, HU Habermeier, WD Sawyer, M Singh
Applied Physics A 41, 175-178, 1986
281986
Photoluminescence of low‐energy ion bombarded silicon
RJ Davis, HU Habermeier, J Weber
Applied physics letters 47 (12), 1295-1297, 1985
281985
High‐power AlGaAs/GaAs single quantum well lasers with chemically assisted ion beam etched mirrors
P Tihanyi, DK Wagner, AJ Roza, HJ Vollmer, CM Harding, RJ Davis, ...
Applied physics letters 50 (23), 1640-1641, 1987
271987
A simple model of the chemically assisted ion beam etching yield of GaAs with Cl2 at medium current densities
RJ Davis, ED Wolf
Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1990
231990
Productive nanosystems: A technology roadmap
KE Drexler, J Randall, S Corchnoy, A Kawczak, ML Steve
Battelle Memorial Institute and Foresight Nanotech Institute, 2007
222007
Solar radiation durability of materials components and systems for low concentration photovoltaic systems
RH French, MP Murray, WC Lin, KA Shell, SA Brown, MA Schuetz, ...
IEEE 2011 EnergyTech, 1-5, 2011
202011
Steady‐state damage profiles due to reactive ion etching and ion‐assisted etching
RJ Davis, P Jha
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1995
171995
Masking considerations in chemically assisted ion beam etching of GaAs/AlGaAs laser structures
A Behfar‐Rad, SS Wong, RJ Davis, ED Wolf
Journal of the Electrochemical Society 136 (3), 779, 1989
141989
High-pressure, high-temperature equations of state using nanofabricated controlled-geometry Ni/SiO2/Ni double hot-plate samples
WRP Jeffrey S. Pigott, Derek A. Ditmer, Rebecca A. Fischer, Daniel M. Reaman ...
Geophysical Research Letters 42 (23), 10,239–10,247, 2015
132015
High-pressure, high-temperature equations of state using nanofabricated controlled-geometry Ni/SiO2/Ni double hot-plate samples
WRP Jeffrey S. Pigott, Derek A. Ditmer, Rebecca A. Fischer, Daniel M. Reaman ...
Geophysical Research Letters, 1, 2015
13*2015
High-power etched-facet lasers
P Tihanyi, DK Wagner, HJ Vollmer, AJ Roza, CM Harding
Electronics Letters 23, 772, 1987
131987
Low threshold ridge waveguide single quantum well laser processed by chemically assisted ion beam etching
L Zhu, G Feak, R Davis, J Ballantyne
IEEE journal of quantum electronics 23 (3), 309-312, 1987
101987
MRS Proceedings
LP Wang, R Wolf, Q Zhou, S Trolier-McKinstry, R Davis
82000
Design and performance of a low-cost acrylic reflector for a~ 7x concentrating photovoltaic module
KA Shell, SA Brown, MA Schuetz, RJ Davis, RH French
High and Low Concentrator Systems for Solar Electric Applications VI 8108, 78-85, 2011
72011
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