Design, fabrication, and measurement of high-sensitivity piezoelectric microelectromechanical systems accelerometers LP Wang, RA Wolf Jr, Y Wang, KK Deng, L Zou, RJ Davis, ... Microelectromechanical Systems, Journal of 12 (4), 433-439, 2003 | 180 | 2003 |
High efficiency and low threshold current strained V‐groove quantum‐wire lasers S Tiwari, GD Pettit, KR Milkove, F Legoues, RJ Davis, JM Woodall Applied physics letters 64 (26), 3536-3538, 1994 | 117 | 1994 |
Microelectromechanical systems (MEMS) accelerometers using lead zirconate titanate thick films LP Wang, K Deng, L Zou, R Wolf, RJ Davis, S Trolier-McKinstry IEEE Electron Device Letters 23 (4), 182-184, 2002 | 72 | 2002 |
Design and construction of a∼ 7× low-concentration photovoltaic system based on compound parabolic concentrators MA Schuetz, KA Shell, SA Brown, GS Reinbolt, RH French, RJ Davis IEEE journal of photovoltaics 2 (3), 382-386, 2012 | 52 | 2012 |
Wet-etch patterning of lead zirconate titanate (PZT) thick films for microelectromechanical systems (MEMS) applications LP Wang, R Wolf, Q Zhou, S Trolier-McKinstry, RJ Davis MRS Online Proceedings Library (OPL) 657, EE5. 39, 2000 | 49 | 2000 |
Image potentials and the dry etching of submicron trenches with low‐energy ions RJ Davis Applied physics letters 59 (14), 1717-1719, 1991 | 30 | 1991 |
Photoluminescence detection of impurities introduced in silicon by dry etching processes J Weber, RJ Davis, HU Habermeier, WD Sawyer, M Singh Applied Physics A 41, 175-178, 1986 | 28 | 1986 |
Photoluminescence of low‐energy ion bombarded silicon RJ Davis, HU Habermeier, J Weber Applied physics letters 47 (12), 1295-1297, 1985 | 28 | 1985 |
High‐power AlGaAs/GaAs single quantum well lasers with chemically assisted ion beam etched mirrors P Tihanyi, DK Wagner, AJ Roza, HJ Vollmer, CM Harding, RJ Davis, ... Applied physics letters 50 (23), 1640-1641, 1987 | 27 | 1987 |
A simple model of the chemically assisted ion beam etching yield of GaAs with Cl2 at medium current densities RJ Davis, ED Wolf Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1990 | 23 | 1990 |
Productive nanosystems: A technology roadmap KE Drexler, J Randall, S Corchnoy, A Kawczak, ML Steve Battelle Memorial Institute and Foresight Nanotech Institute, 2007 | 22 | 2007 |
Solar radiation durability of materials components and systems for low concentration photovoltaic systems RH French, MP Murray, WC Lin, KA Shell, SA Brown, MA Schuetz, ... IEEE 2011 EnergyTech, 1-5, 2011 | 20 | 2011 |
Steady‐state damage profiles due to reactive ion etching and ion‐assisted etching RJ Davis, P Jha Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1995 | 17 | 1995 |
Masking considerations in chemically assisted ion beam etching of GaAs/AlGaAs laser structures A Behfar‐Rad, SS Wong, RJ Davis, ED Wolf Journal of the Electrochemical Society 136 (3), 779, 1989 | 14 | 1989 |
High-pressure, high-temperature equations of state using nanofabricated controlled-geometry Ni/SiO2/Ni double hot-plate samples WRP Jeffrey S. Pigott, Derek A. Ditmer, Rebecca A. Fischer, Daniel M. Reaman ... Geophysical Research Letters 42 (23), 10,239–10,247, 2015 | 13 | 2015 |
High-pressure, high-temperature equations of state using nanofabricated controlled-geometry Ni/SiO2/Ni double hot-plate samples WRP Jeffrey S. Pigott, Derek A. Ditmer, Rebecca A. Fischer, Daniel M. Reaman ... Geophysical Research Letters, 1, 2015 | 13* | 2015 |
High-power etched-facet lasers P Tihanyi, DK Wagner, HJ Vollmer, AJ Roza, CM Harding Electronics Letters 23, 772, 1987 | 13 | 1987 |
Low threshold ridge waveguide single quantum well laser processed by chemically assisted ion beam etching L Zhu, G Feak, R Davis, J Ballantyne IEEE journal of quantum electronics 23 (3), 309-312, 1987 | 10 | 1987 |
MRS Proceedings LP Wang, R Wolf, Q Zhou, S Trolier-McKinstry, R Davis | 8 | 2000 |
Design and performance of a low-cost acrylic reflector for a~ 7x concentrating photovoltaic module KA Shell, SA Brown, MA Schuetz, RJ Davis, RH French High and Low Concentrator Systems for Solar Electric Applications VI 8108, 78-85, 2011 | 7 | 2011 |