N. Laidani
N. Laidani
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Optical absorption parameters of amorphous carbon films from Forouhi–Bloomer and Tauc–Lorentz models: a comparative study
N Laidani, R Bartali, G Gottardi, M Anderle, P Cheyssac
Journal of Physics: Condensed Matter 20 (1), 015216, 2007
Spectroscopic characterization of thermally treated carbon-rich Si1− xCx films
N Laidani, R Capelletti, M Elena, L Guzman, G Mariotto, A Miotello, ...
Thin Solid Films 223 (1), 114-121, 1993
PDMS residues-free micro/macrostructures on flexible substrates
R Dahiya, G Gottardi, N Laidani
Microelectronic Engineering 136, 57-62, 2015
Measurement of the relative abundance of sp2 and sp3 hybridised atoms in carbon based materials by XPS: a critical approach. Part I
G Speranza, N Laidani
Diamond and related materials 13 (3), 445-450, 2004
Chemical structure of films grown by AlN laser ablation: an X-ray photoelectron spectroscopy study
N Laidani, L Vanzetti, M Anderle, A Basillais, C Boulmer-Leborgne, ...
Surface and Coatings Technology 122 (2-3), 242-246, 1999
Structural and compositional study of B–C–N films produced by laser ablation of B4C targets in N2 atmosphere
N Laidani, M Anderle, R Canteri, L Elia, A Luches, M Martino, V Micheli, ...
Applied surface science 157 (3), 135-144, 2000
Structural and near-infra red luminescence properties of Nd-doped TiO 2 films deposited by RF sputtering
R Pandiyan, V Micheli, D Ristic, R Bartali, G Pepponi, M Barozzi, ...
Journal of Materials Chemistry 22 (42), 22424-22432, 2012
Plasma and nitrides: application to the nitriding of titanium
A Gicquel, N Laidani, P Saillard
Pure and applied chemistry 62 (9), 1743-1750, 1990
Influence of hydrogen addition to an Ar plasma on the structural properties of TiO2− x thin films deposited by RF sputtering
I Luciu, R Bartali, N Laidani
Journal of Physics D: Applied Physics 45 (34), 345302, 2012
Intrinsic defects and their influence on the chemical and optical properties of TiO2− x films
N Laidani, P Cheyssac, J Perriere, R Bartali, G Gottardi, I Luciu, V Micheli
Journal of Physics D: Applied Physics 43 (48), 485402, 2010
PDMS/Kapton interface plasma treatment effects on the polymeric package for a wearable thermoelectric generator
L Francioso, C De Pascali, R Bartali, E Morganti, L Lorenzelli, P Siciliano, ...
ACS Applied Materials & Interfaces 5 (14), 6586-6590, 2013
Argon–hydrogen rf plasma study for carbon film deposition
N Laidani, R Bartali, P Tosi, M Anderle
Journal of Physics D: Applied Physics 37 (18), 2593, 2004
Chemical and compositional changes induced by N+ implantation in amorphous SiC films
N Laidani, M Bonelli, A Miotello, L Guzman, L Calliari, M Elena, ...
Journal of applied physics 74 (3), 2013-2020, 1993
Mechanical and tribological properties of CNx films deposited by reactive pulsed laser ablation
A Zocco, A Perrone, E Broitman, Z Czigany, L Hultman, M Anderle, ...
Diamond and related materials 11 (1), 98-104, 2002
Low temperature growth study of nano-crystalline TiO2 thin films deposited by RF sputtering
K Safeen, V Micheli, R Bartali, G Gottardi, N Laidani
Journal of Physics D: Applied Physics 48 (29), 295201, 2015
Development of W–SiO2 and Nb–TiO2 solar absorber coatings for combined heat and power systems at intermediate operation temperatures
E Wäckelgård, A Mattsson, R Bartali, R Gerosa, G Gottardi, F Gustavsson, ...
Solar Energy Materials and Solar Cells 133, 180-193, 2015
Mechanical and structural properties of Ni-C films obtained by RF sputtering
N Laidani, L Calliari, G Speranza, V Micheli, E Galvanetto
Surface and Coatings Technology 100, 116-124, 1998
Investigation of structural and optical properties of sputtered Zirconia thin films
F Rebib, N Laidani, G Gottardi, V Micheli, R Bartali, Y Jestin, E Tomasella, ...
The European Physical Journal-Applied Physics 43 (3), 363-368, 2008
Plasma enhanced chemical vapor deposition of aC: H films in CH4–CO2 plasma: Gas composition and substrate biasing effects on the film structure and growth process
G Gottardi, N Laidani, R Bartali, V Micheli, M Anderle
Thin Solid Films 516 (12), 3910-3918, 2008
Effects of oxygen concentration in the Ar/O2 plasma on the bulk structure and surface properties of RF reactively sputtered zirconia thin films
G Gottardi, N Laidani, V Micheli, R Bartali, M Anderle
Surface and Coatings Technology 202 (11), 2332-2337, 2008
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