| Optical absorption parameters of amorphous carbon films from Forouhi–Bloomer and Tauc–Lorentz models: a comparative study N Laidani, R Bartali, G Gottardi, M Anderle, P Cheyssac Journal of Physics: Condensed Matter 20 (1), 015216, 2007 | 105 | 2007 |
| Spectroscopic characterization of thermally treated carbon-rich Si1− xCx films N Laidani, R Capelletti, M Elena, L Guzman, G Mariotto, A Miotello, ... Thin Solid Films 223 (1), 114-121, 1993 | 85 | 1993 |
| PDMS residues-free micro/macrostructures on flexible substrates R Dahiya, G Gottardi, N Laidani Microelectronic Engineering 136, 57-62, 2015 | 74 | 2015 |
| Measurement of the relative abundance of sp2 and sp3 hybridised atoms in carbon based materials by XPS: a critical approach. Part I G Speranza, N Laidani Diamond and related materials 13 (3), 445-450, 2004 | 70 | 2004 |
| Chemical structure of films grown by AlN laser ablation: an X-ray photoelectron spectroscopy study N Laidani, L Vanzetti, M Anderle, A Basillais, C Boulmer-Leborgne, ... Surface and Coatings Technology 122 (2-3), 242-246, 1999 | 66 | 1999 |
| Structural and compositional study of B–C–N films produced by laser ablation of B4C targets in N2 atmosphere N Laidani, M Anderle, R Canteri, L Elia, A Luches, M Martino, V Micheli, ... Applied surface science 157 (3), 135-144, 2000 | 63 | 2000 |
| Structural and near-infra red luminescence properties of Nd-doped TiO 2 films deposited by RF sputtering R Pandiyan, V Micheli, D Ristic, R Bartali, G Pepponi, M Barozzi, ... Journal of Materials Chemistry 22 (42), 22424-22432, 2012 | 61 | 2012 |
| Plasma and nitrides: application to the nitriding of titanium A Gicquel, N Laidani, P Saillard Pure and applied chemistry 62 (9), 1743-1750, 1990 | 61 | 1990 |
| Influence of hydrogen addition to an Ar plasma on the structural properties of TiO2− x thin films deposited by RF sputtering I Luciu, R Bartali, N Laidani Journal of Physics D: Applied Physics 45 (34), 345302, 2012 | 59 | 2012 |
| Intrinsic defects and their influence on the chemical and optical properties of TiO2− x films N Laidani, P Cheyssac, J Perriere, R Bartali, G Gottardi, I Luciu, V Micheli Journal of Physics D: Applied Physics 43 (48), 485402, 2010 | 53 | 2010 |
| PDMS/Kapton interface plasma treatment effects on the polymeric package for a wearable thermoelectric generator L Francioso, C De Pascali, R Bartali, E Morganti, L Lorenzelli, P Siciliano, ... ACS Applied Materials & Interfaces 5 (14), 6586-6590, 2013 | 46 | 2013 |
| Argon–hydrogen rf plasma study for carbon film deposition N Laidani, R Bartali, P Tosi, M Anderle Journal of Physics D: Applied Physics 37 (18), 2593, 2004 | 44 | 2004 |
| Chemical and compositional changes induced by N+ implantation in amorphous SiC films N Laidani, M Bonelli, A Miotello, L Guzman, L Calliari, M Elena, ... Journal of applied physics 74 (3), 2013-2020, 1993 | 42 | 1993 |
| Mechanical and tribological properties of CNx films deposited by reactive pulsed laser ablation A Zocco, A Perrone, E Broitman, Z Czigany, L Hultman, M Anderle, ... Diamond and related materials 11 (1), 98-104, 2002 | 38 | 2002 |
| Low temperature growth study of nano-crystalline TiO2 thin films deposited by RF sputtering K Safeen, V Micheli, R Bartali, G Gottardi, N Laidani Journal of Physics D: Applied Physics 48 (29), 295201, 2015 | 37 | 2015 |
| Development of W–SiO2 and Nb–TiO2 solar absorber coatings for combined heat and power systems at intermediate operation temperatures E Wäckelgård, A Mattsson, R Bartali, R Gerosa, G Gottardi, F Gustavsson, ... Solar Energy Materials and Solar Cells 133, 180-193, 2015 | 37 | 2015 |
| Mechanical and structural properties of Ni-C films obtained by RF sputtering N Laidani, L Calliari, G Speranza, V Micheli, E Galvanetto Surface and Coatings Technology 100, 116-124, 1998 | 36 | 1998 |
| Investigation of structural and optical properties of sputtered Zirconia thin films F Rebib, N Laidani, G Gottardi, V Micheli, R Bartali, Y Jestin, E Tomasella, ... The European Physical Journal-Applied Physics 43 (3), 363-368, 2008 | 31 | 2008 |
| Plasma enhanced chemical vapor deposition of aC: H films in CH4–CO2 plasma: Gas composition and substrate biasing effects on the film structure and growth process G Gottardi, N Laidani, R Bartali, V Micheli, M Anderle Thin Solid Films 516 (12), 3910-3918, 2008 | 31 | 2008 |
| Effects of oxygen concentration in the Ar/O2 plasma on the bulk structure and surface properties of RF reactively sputtered zirconia thin films G Gottardi, N Laidani, V Micheli, R Bartali, M Anderle Surface and Coatings Technology 202 (11), 2332-2337, 2008 | 30 | 2008 |
Gloria GottardiFondazione Bruno Kessler, Center for Materials and Microsystems, PAM-SE unit (Plasma, AdvancedVerified email at fbk.eu
