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David Vender
David Vender
Teaching Fellow, University of Tasmania
Verified email at utas.edu.au
Title
Cited by
Cited by
Year
The application of the helicon source to plasma processing
AJ Perry, D Vender, RW Boswell
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1991
3201991
Numerical modeling of low-pressure RF plasmas
D Vender, RW Boswell
IEEE transactions on plasma science 18 (4), 725-732, 1990
2731990
Fluorocarbon high‐density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
GS Oehrlein, Y Zhang, D Vender, M Haverlag
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 12 (2 …, 1994
2701994
Negative ions in a radio-frequency oxygen plasma
E Stoffels, WW Stoffels, D Vender, M Kando, GMW Kroesen, FJ De Hoog
Physical Review E 51 (3), 2425, 1995
2511995
Fluorocarbon high‐density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF3
GS Oehrlein, Y Zhang, D Vender, O Joubert
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 12 (2 …, 1994
2141994
Apparatus for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability
GS Oehrlein, D Vender, Y Zhang, M Haverlag
US Patent 5,798,016, 1998
1461998
Collisionless electron heating by capacitive rf sheaths
G Gozadinos, MM Turner, D Vender
Physical review letters 87 (13), 135004, 2001
1442001
Characterization of the E to H transition in a pulsed inductively coupled plasma discharge with internal coil geometry: bi-stability and hysteresis
G Cunge, B Crowley, D Vender, MM Turner
Plasma sources science and technology 8 (4), 576, 1999
1391999
Electron–sheath interaction in capacitive radio‐frequency plasmas
D Vender, RW Boswell
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10 (4 …, 1992
1161992
Charged-species profiles in electronegative radio-frequency plasmas
D Vender, WW Stoffels, E Stoffels, GMW Kroesen, FJ De Hoog
Physical Review E 51 (3), 2436, 1995
981995
Investigation of selective SiO2‐to‐Si etching in an inductively coupled high‐density plasma using fluorocarbon gases
FH Bell, O Joubert, GS Oehrlein, Y Zhang, D Vender
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 12 (6 …, 1994
691994
Transport of argon ions in an inductively coupled high-density plasma reactor
N Sadeghi, M Van De Grift, D Vender, GMW Kroesen, FJ De Hoog
Applied physics letters 70 (7), 835-837, 1997
611997
Simulations of multipactor‐assisted breakdown in radio frequency plasmas
D Vender, HB Smith, RW Boswell
Journal of applied physics 80 (8), 4292-4298, 1996
581996
Plasma ionization through wave-particle interaction in a capacitively coupled radio-frequency discharge
D O’Connell, T Gans, D Vender, U Czarnetzki, R Boswell
Physics of plasmas 14 (3), 2007
542007
Global model of a radiofrequency H2 plasma in DENISE
R Zorat, J Goss, D Boilson, D Vender
Plasma Sources Science and Technology 9 (2), 161, 2000
542000
Sidewall passivation during the etching of poly‐Si in an electron cyclotron resonance plasma of HBr
M Haverlag, GS Oehrlein, D Vender
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994
521994
Bohm velocity with a two-temperature distribution of negative particles
RW Boswell, AJ Lichtenberg, D Vender
IEEE transactions on plasma science 20 (2), 62-65, 1992
511992
An experimental study of breakdown in a pulsed helicon plasma
RW Boswell, D Vender
Plasma Sources Science and Technology 4 (4), 534, 1995
501995
Anomalous skin effect and collisionless power dissipation in inductively coupled discharges
G Cunge, B Crowley, D Vender, MM Turner
Journal of Applied Physics 89 (7), 3580-3589, 2001
492001
Negative ions in low pressure discharges
E Stoffels, WW Stoffels, D Vender, M Haverlag, GMW Kroesen, ...
Contributions to Plasma Physics 35 (4‐5), 331-357, 1995
471995
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