| Pressure-dependent phase transition of 2D layered silicon telluride (Si2Te3) and manganese intercalated silicon telluride VL Johnson, A Anilao, KJ Koski Nano Research 12, 2373-2377, 2019 | 21 | 2019 |
| Thermal Atomic Layer Etching of CoO, ZnO, Fe2O3, and NiO by Chlorination and Ligand Addition Using SO2Cl2 and Tetramethylethylenediamine JL Partridge, JA Murdzek, VL Johnson, AS Cavanagh, A Fischer, T Lill, ... Chemistry of Materials 35 (5), 2058-2068, 2023 | 12 | 2023 |
| Volatile Products from Ligand Addition of P(CH3)3 to NiCl2, PdCl2, and PtCl2: Pathway for Metal Thermal Atomic Layer Etching A Lii-Rosales, VL Johnson, S Sharma, A Fischer, T Lill, SM George The Journal of Physical Chemistry C 126 (19), 8287-8295, 2022 | 10 | 2022 |
| Effectiveness of Different Ligands on Silane Precursors for Ligand Exchange to Etch Metal Fluorides A Lii-Rosales, VL Johnson, AS Cavanagh, A Fischer, T Lill, S Sharma, ... Chemistry of Materials 34 (19), 8641-8653, 2022 | 6 | 2022 |
| Mn-intercalated MoSe2 under pressure: Electronic structure and vibrational characterization of a dilute magnetic semiconductor S Chen, VL Johnson, D Donadio, KJ Koski The Journal of chemical physics 153 (12), 2020 | 6 | 2020 |
| Thermal Atomic Layer Etching of Gold Using Sulfuryl Chloride for Chlorination and Triethylphosphine for Ligand Addition JL Partridge, JA Murdzek, VL Johnson, AS Cavanagh, S Sharma, ... Chemistry of Materials, 2024 | 1 | 2024 |
| Volatile Methyl Siloxane Atmospheric Oxidation Mechanism from a Theoretical Perspective─ How is the Siloxanol Formed? MW Alton, VL Johnson, S Sharma, EC Browne The Journal of Physical Chemistry A 127 (48), 10233-10242, 2023 | 1 | 2023 |
| Thermal Atomic Layer Etching of CoO, ZnO, Fe2O3, and NiO by Chlorination and Ligand Addition Using SO2Cl2 and Tetramethylethylenediamine JA Murdzek, VL Johnson, AS Cavanagh, A Fischer, T Lill, S Sharma, ... CHEMISTRY OF MATERIALS, 2023 | | 2023 |
| Experimental and Theoretical Investigation into Volatile Methyl Siloxane Oxidation Mechanism M Alton, V Johnson, S Sharma, E Browne AGU Fall Meeting Abstracts 2021, A55L-1554, 2021 | | 2021 |
| (Invited) Volatile Products during Thermal Atomic Layer Etching of Metal Oxides and Elemental Metals A Lii-Rosales, V Johnson, S Sharma, AS Cavanagh, SM George Electrochemical Society Meeting Abstracts 239, 844-844, 2021 | | 2021 |
