| Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics HC Lee Applied Physics Reviews 5 (1), 2018 | 135 | 2018 |
| Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma HC Lee, MH Lee, CW Chung Applied Physics Letters 96 (7), 2010 | 97 | 2010 |
| Experimental observation of the transition from nonlocal to local electron kinetics in inductively coupled plasmas HC Lee, MH Lee, CW Chung Applied Physics Letters 96 (4), 2010 | 91 | 2010 |
| Evolution of the electron energy distribution and EH mode transition in inductively coupled nitrogen plasma HC Lee, JK Lee, CW Chung Physics of Plasmas 17 (3), 2010 | 74 | 2010 |
| Collisionless electron heating by radio frequency bias in low gas pressure inductive discharge HC Lee, CW Chung Applied Physics Letters 101 (24), 2012 | 59 | 2012 |
| Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma HC Lee, JY Bang, CW Chung Thin Solid Films 519 (20), 7009-7013, 2011 | 52 | 2011 |
| Discharge mode transition and hysteresis in inductively coupled plasma HC Lee, DH Kim, CW Chung Applied Physics Letters 102 (23), 2013 | 43 | 2013 |
| Comparison of pressure dependence of electron energy distributions in oxygen capacitively and inductively coupled plasmas MH Lee, HC Lee, CW Chung Physical Review E 81 (4), 046402, 2010 | 43 | 2010 |
| Experimental measurements of spatial plasma potentials and electron energy distributions in inductively coupled plasma under weakly collisional and nonlocal electron kinetic … HC Lee, CW Chung Physics of Plasmas 19 (3), 2012 | 42 | 2012 |
| E–H mode transition in inductively coupled plasma using Ar, O2, N2, and mixture gas JK Lee, HC Lee, CW Chung Current Applied Physics 11 (5), S149-S153, 2011 | 42 | 2011 |
| Precise depth control and low-damage atomic-layer etching of HfO2 using BCl3 and Ar neutral beam SD Park, WS Lim, BJ Park, HC Lee, JW Bae, GY Yeom Electrochemical and Solid-State Letters 11 (4), H71, 2008 | 38 | 2008 |
| Experimental observation of the skin effect on plasma uniformity in inductively coupled plasmas with a radio frequency bias HC Lee, SJ Oh, CW Chung Plasma Sources Science and Technology 21 (3), 035003, 2012 | 36 | 2012 |
| Effect of the surface texturing shapes fabricated using dry etching on the extraction efficiency of vertical light-emitting diodes HC Lee, JB Park, JW Bae, PTT Thuy, MC Yoo, GY Yeom Solid-state electronics 52 (8), 1193-1196, 2008 | 36 | 2008 |
| Effect of electron energy distribution on the hysteresis of plasma discharge: Theory, experiment and modeling HC Lee, CW Chung Scientific reports 5 (1), 15254, 2015 | 34 | 2015 |
| Low energy electron heating and evolution of the electron energy distribution by diluted O2 in an inductive Ar/O2 mixture discharge HC Lee, MH Lee, CW Chung Physics of Plasmas 17, 013501, 2010 | 34 | 2010 |
| Evolution of electron temperature in inductively coupled plasma HC Lee, BH Seo, DC Kwon, JH Kim, DJ Seong, SJ Oh, CW Chung, ... Applied Physics Letters 110 (1), 2017 | 31 | 2017 |
| Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias MY Yoon, HJ Yeom, JH Kim, W Chegal, YJ Cho, DC Kwon, JR Jeong, ... Physics of Plasmas 28 (6), 2021 | 30 | 2021 |
| Effect of antenna size on electron kinetics in inductively coupled plasmas HC Lee, CW Chung Physics of Plasmas 20 (10), 2013 | 30 | 2013 |
| Experimental verification of the Boltzmann relation in confined plasmas: comparison of noble and molecule gases HC Lee, HJ Hwang, YC Kim, JY Kim, DH Kim, CW Chung Physics of Plasmas 20 (3), 2013 | 28 | 2013 |
| Anisotropic Etching of InP and InGaAs by Using an Inductively Coupled Plasma in Cl~ 2/N~ 2 and Cl~ 2/Ar Mixtures at Low Bias Power JW Bae, CH Jeong, JT Lim, HC Lee, GY Yeom, I Adesida JOURNAL-KOREAN PHYSICAL SOCIETY 50 (4), 1130, 2007 | 27 | 2007 |
