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Sean King
Sean King
Principal Engineer
Verified email at intel.com
Title
Cited by
Cited by
Year
Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate
A Ott, S King, A Sharma
US Patent 8,120,114, 2012
4112012
Cleaning of AlN and GaN surfaces
SW King, JP Barnak, MD Bremser, KM Tracy, C Ronning, RF Davis, ...
Journal of applied physics 84 (9), 5248-5260, 1998
4041998
Adhesion and electromigration performance at an interface between a dielectric and metal
S King, J Klaus
US Patent 8,178,436, 2012
3962012
Plasma enhanced atomic layer deposition of SiNx: H and SiO2
SW King
Journal of Vacuum Science & Technology A 29 (4), 2011
2102011
Selective deposition of amorphous silicon films on metal gates
J Klaus, S King, W Rachmady
US Patent 7,816,218, 2010
2082010
Cleaning of GaN surfaces
LL Smith, SW King, RJ Nemanich, RF Davis
Journal of electronic materials 25 (5), 805-810, 1996
1961996
Dielectric barrier, etch stop, and metal capping materials for state of the art and beyond metal interconnects
SW King
ECS Journal of Solid State Science and Technology 4 (1), N3029, 2014
1812014
UV photoemission study of heteroepitaxial AlGaN films grown on 6H-SiC
MC Benjamin, MD Bremser, TW Weeks Jr, SW King, RF Davis, ...
Applied Surface Science 104, 455-460, 1996
1521996
Negative electron affinity surfaces of aluminum nitride and diamond
RJ Nemanich, PK Baumann, MC Benjamin, ...
Diamond Relat. Mater 5 (6), 790-796, 1996
1351996
Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC: H thin films
SW King, M French, J Bielefeld, WA Lanford
Journal of Non-Crystalline Solids 357 (15), 2970-2983, 2011
1172011
Thermal conductivity and thermal boundary resistance of atomic layer deposited high-k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on …
EA Scott, JT Gaskins, SW King, PE Hopkins
APL Materials 6 (5), 058302, 2018
1132018
Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-k Dielectrics: Beryllium Oxide, Aluminum …
JT Gaskins, PE Hopkins, DR Merrill, SR Bauers, E Hadland, DC Johnson, ...
ECS Journal of Solid State Science and Technology 6 (10), N189-N208, 2017
1092017
Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
N Alimardani, SW King, BL French, C Tan, BP Lampert, JF Conley
Journal of Applied Physics 116 (2), 2014
992014
Dependence of (0001) GaN/AlN valence band discontinuity on growth temperature and surface reconstruction
SW King, C Ronning, RF Davis, MC Benjamin, RJ Nemanich
Journal of applied physics 84 (4), 2086-2090, 1998
941998
Influence of network bond percolation on the thermal, mechanical, electrical and optical properties of high and low-k a-SiC: H thin films
SW King, J Bielefeld, G Xu, WA Lanford, Y Matsuda, RH Dauskardt, N Kim, ...
Journal of Non-Crystalline Solids 379, 67-79, 2013
852013
Research Updates: The three M's (materials, metrology, and modeling) together pave the path to future nanoelectronic technologies
SW King, H Simka, D Herr, H Akinaga, M Garner
APL Materials 1 (4), 040701, 2013
822013
Selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal
AK Sharma, S King, D Hanken, AW Ott
US Patent 7,790,631, 2010
782010
Intrinsic stress effect on fracture toughness of plasma enhanced chemical vapor deposited SiN x: H films
S King, R Chu, G Xu, J Huening
Thin Solid Films 518 (17), 4898-4907, 2010
782010
Film property requirements for hermetic low-k a-SiOxCyNz: H dielectric barriers
SW King, D Jacob, D Vanleuven, B Colvin, J Kelly, M French, J Bielefeld, ...
ECS Journal of Solid State Science and Technology 1 (6), N115, 2012
732012
Wet Chemical Processing of (0001) Si 6H‐SiC Hydrophobic and Hydrophilic Surfaces
SW King, RJ Nemanich, RF Davisa
Journal of the Electrochemical Society 146 (5), 1910-1917, 1999
721999
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Articles 1–20