Ramsankar Senthamaraikannan
Ramsankar Senthamaraikannan
Verified email at tcd.ie
TitleCited byYear
Swift Nanopattern Formation of PS-b-PMMA and PS-b-PDMS Block Copolymer Films Using a Microwave Assisted Technique
D Borah, R Senthamaraikannan, S Rasappa, B Kosmala, JD Holmes, ...
ACS nano 7 (8), 6583-6596, 2013
642013
“In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays
T Ghoshal, R Senthamaraikannan, MT Shaw, JD Holmes, MA Morris
Nanoscale 4 (24), 7743-7750, 2012
412012
Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application
T Ghoshal, T Maity, R Senthamaraikannan, MT Shaw, P Carolan, ...
Scientific reports 3, 2772, 2013
322013
Orientation and Alignment Control of Microphase-Separated PS-b-PDMS Substrate Patterns via Polymer Brush Chemistry
D Borah, S Rasappa, R Senthamaraikannan, B Kosmala, MT Shaw, ...
ACS applied materials & interfaces 5 (1), 88-97, 2012
292012
Fabrication of Ordered, Large Scale, Horizontally‐Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach
T Ghoshal, R Senthamaraikannan, MT Shaw, JD Holmes, MA Morris
Advanced Materials 26 (8), 1207-1216, 2014
272014
Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures for Applications in Optics
P Mokarian-Tabari, R Senthamaraikannan, C Glynn, TW Collins, ...
Nano Letters 17 (5), 2973-2978, 2017
242017
Block copolymer lithography: Feature size control and extension by an over-etch technique
S Rasappa, D Borah, R Senthamaraikannan, CC Faulkner, MT Shaw, ...
Thin Solid Films 522, 318-323, 2012
222012
Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS
D Borah, CD Simao, R Senthamaraikannan, S Rasappa, A Francone, ...
European Polymer Journal 49 (11), 3512-3521, 2013
152013
The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions
D Borah, S Rasappa, R Senthamaraikannan, MT Shaw, JD Holmes, ...
Journal of colloid and interface science 393, 192-202, 2013
132013
Tuning PDMS Brush Chemistry by UV–O3 Exposure for PS-b-PDMS Microphase Separation and Directed Self-assembly
D Borah, S Rasappa, R Senthamaraikannan, JD Holmes, MA Morris
Langmuir 29 (28), 8959-8968, 2013
112013
A Highly Efficient Sensor Platform Using Simply Manufactured Nanodot Patterned Substrates
S Rasappa, T Ghoshal, D Borah, R Senthamaraikannan, JD Holmes, ...
Scientific reports 5, 13270, 2015
62015
Fabrication of Germanium Nanowire Arrays by Block Copolymer Lithography
S Rasappa, D Borah, R Senthamaraikannan, CC Faulkner, JJ Wang, ...
Science of Advanced Materials 5 (7), 782-787, 2013
52013
The development and advantages of helium ion microscopy for the study of block copolymer nanopatterns
AP Bell, R Senthamaraikannan, T Ghoshal, A Chaudhari, MT Shaw, ...
Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015
32015
Fabrication of 3-D Nanodimensioned Electric Double Layer Capacitor Structures Using Block Copolymer Templates
S Rasappa, D Borah, R Senthamaraikannan, CC Faulkner, JD Holmes, ...
Journal of Nanoscience and Nanotechnology 14 (7), 5221-5227, 2014
32014
Graphoepitaxial Directed Self‐Assembly of Polystyrene‐Block‐Polydimethylsiloxane Block Copolymer on Substrates Functionalized with Hexamethyldisilazane to …
D Borah, S Rasappa, R Senthamaraikannan, JD Holmes, MA Morris
Advanced Materials Interfaces 1 (3), 1300102, 2014
32014
Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates
D Borah, S Rasappa, R Senthamaraikannan, JD Holmes, MA Morris
Polymers 7 (4), 592-609, 2015
22015
Production of bacterial nanocellulose (BNC) and its application as a solid support in transition metal catalysed cross-coupling reactions
S Jeremic, L Djokic, V Ajdačić, N Božinović, V Pavlovic, DD Manojlović, ...
International journal of biological macromolecules 129, 351-360, 2019
12019
Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly (dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography
D Borah, C Cummins, S Rasappa, R Senthamaraikannan, M Salaun, ...
Nanomaterials 8 (1), 32, 2018
12018
Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods
C Cummins, D Borah, S Rasappa, R Senthamaraikannan, C Simao, ...
ACS Omega 2 (8), 4417-4423, 2017
12017
An in-situ hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate
T Ghoshal, R Senthamaraikannan, MT Shaw, JD Holmes, MA Morris
Advances in Patterning Materials and Processes XXXI 9051, 90510J, 2014
12014
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