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Qing Luo
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An artificial spiking afferent nerve based on Mott memristors for neurorobotics
X Zhang, Y Zhuo, Q Luo, Z Wu, R Midya, Z Wang, W Song, R Wang, ...
Nature communications 11 (1), 51, 2020
3492020
A highly CMOS compatible hafnia-based ferroelectric diode
Q Luo, Y Cheng, J Yang, R Cao, H Ma, Y Yang, R Huang, W Wei, ...
Nature communications 11 (1), 1391, 2020
1962020
Improvement of endurance in HZO-based ferroelectric capacitor using Ru electrode
R Cao, B Song, D Shang, Y Yang, Q Luo, S Wu, Y Li, Y Wang, H Lv, Q Liu, ...
IEEE Electron Device Letters 40 (11), 1744-1747, 2019
1252019
Super non-linear RRAM with ultra-low power for 3D vertical nano-crossbar arrays
Q Luo, X Xu, H Liu, H Lv, T Gong, S Long, Q Liu, H Sun, W Banerjee, L Li, ...
Nanoscale 8 (34), 15629-15636, 2016
1212016
Wake‐Up Effect in HfO2‐Based Ferroelectric Films
P Jiang, Q Luo, X Xu, T Gong, P Yuan, Y Wang, Z Gao, W Wei, L Tai, H Lv
Advanced Electronic Materials 7 (1), 2000728, 2021
1182021
Full imitation of synaptic metaplasticity based on memristor devices
Q Wu, H Wang, Q Luo, W Banerjee, J Cao, X Zhang, F Wu, Q Liu, L Li, ...
Nanoscale 10 (13), 5875-5881, 2018
1122018
Demonstration of 3D vertical RRAM with ultra low-leakage, high-selectivity and self-compliance memory cells
Q Luo, X Xu, H Liu, H Lv, T Gong, S Long, Q Liu, H Sun, W Banerjee, L Li, ...
2015 IEEE International Electron Devices Meeting (IEDM), 10.2. 1-10.2. 4, 2015
1042015
8-Layers 3D vertical RRAM with excellent scalability towards storage class memory applications
Q Luo, X Xu, T Gong, H Lv, D Dong, H Ma, P Yuan, J Gao, J Liu, Z Yu, J Li, ...
2017 IEEE International Electron Devices Meeting (IEDM), 2.7. 1-2.7. 4, 2017
982017
Atomic view of filament growth in electrochemical memristive elements
H Lv, X Xu, P Sun, H Liu, Q Luo, Q Liu, W Banerjee, H Sun, S Long, L Li, ...
Scientific Reports 5 (1), 13311, 2015
932015
Self-rectifying and forming-free resistive-switching device for embedded memory application
Q Luo, X Zhang, Y Hu, T Gong, X Xu, P Yuan, H Ma, D Dong, H Lv, ...
IEEE Electron Device Letters 39 (5), 664-667, 2018
882018
A stable rhombohedral phase in ferroelectric Hf(Zr)1+xO2 capacitor with ultralow coercive field
Y Wang, L Tao, R Guzman, Q Luo, W Zhou, Y Yang, Y Wei, Y Liu, P Jiang, ...
Science 381 (6657), 558-563, 2023
852023
A computing-in-memory macro based on three-dimensional resistive random-access memory
Q Huo, Y Yang, Y Wang, D Lei, X Fu, Q Ren, X Xu, Q Luo, G Xing, C Chen, ...
Nature Electronics 5 (7), 469-477, 2022
822022
Cu BEOL compatible selector with high selectivity (> 107), extremely low off-current (∼ pA) and high endurance (> 1010)
Q Luo, X Xu, H Liu, H Lv, T Gong, S Long, Q Liu, H Sun, W Banerjee, L Li, ...
2015 IEEE International Electron Devices Meeting (IEDM), 10.4. 1-10.4. 4, 2015
802015
Design of CMOS compatible, high‐speed, highly‐stable complementary switching with multilevel operation in 3D vertically stacked novel HfO2/Al2O3/TiOx (HAT) RRAM
W Banerjee, X Zhang, Q Luo, H Lv, Q Liu, S Long, M Liu
Advanced Electronic Materials 4 (2), 1700561, 2018
722018
BEOL based RRAM with one extra-mask for low cost, highly reliable embedded application in 28 nm node and beyond
H Lv, X Xu, P Yuan, D Dong, T Gong, J Liu, Z Yu, P Huang, K Zhang, ...
2017 IEEE International Electron Devices Meeting (IEDM), 2.4. 1-2.4. 4, 2017
602017
Fully CMOS compatible 3D vertical RRAM with self-aligned self-selective cell enabling sub-5nm scaling
X Xu, Q Luo, T Gong, H Lv, S Long, Q Liu, SS Chung, J Li, M Liu
2016 IEEE Symposium on VLSI Technology, 1-2, 2016
602016
Robust Breakdown Reliability and Improved Endurance in Hf0.5Zr0.5O2 Ferroelectric Using Grain Boundary Interruption
Y Xu, Y Yang, S Zhao, T Gong, P Jiang, S Lv, H Yu, P Yuan, Z Dang, ...
IEEE Transactions on Electron Devices 69 (1), 430-433, 2021
462021
Composition-Dependent Ferroelectric Properties in Sputtered HfXZr1−XO2 Thin Films
Q Luo, H Ma, H Su, KH Xue, R Cao, Z Gao, J Yu, T Gong, X Xu, J Yin, ...
IEEE Electron Device Letters 40 (4), 570-573, 2019
452019
Hybrid 1T e-DRAM and e-NVM realized in one 10 nm node ferro FinFET device with charge trapping and domain switching effects
Q Luo, T Gong, Y Cheng, Q Zhang, H Yu, J Yu, H Ma, X Xu, K Huang, ...
2018 IEEE International Electron Devices Meeting (IEDM), 2.6. 1-2.6. 4, 2018
442018
Investigation of LRS dependence on the retention of HRS in CBRAM
X Xu, H Lv, H Liu, Q Luo, T Gong, M Wang, G Wang, M Zhang, Y Li, Q Liu, ...
Nanoscale Research Letters 10, 1-6, 2015
402015
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