Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors V Georgieva, A Bogaerts, R Gijbels Physical Review E 69 (2), 026406, 2004 | 154 | 2004 |
Plasma assisted catalytic decomposition of CO2 G. Chen, V. Georgieva, T. Godfroid, R. Snyders, M.-P. Delplancke-Ogletree Applied Catalysis B: Environmental 190, 115-124, 2016 | 143 | 2016 |
Numerical study of discharges in single- and dual-frequency capacitively coupled plasma reactors V Georgieva, A Bogaerts, R Gijbels Journal of applied physics 94 (6), 3748-3756, 2003 | 132 | 2003 |
An overview on CO2 conversion in a microwave discharge: the role of plasma-catalysis G Chen, N Britun, T Godfroid, V Georgieva, R Snyders, ... Journal of Physics D: Applied Physics 50, 084001, 2017 | 108 | 2017 |
Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristics V Georgieva, A Bogaerts Journal of applied physics 98 (2), 2005 | 104 | 2005 |
Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency discharge: Effect of gas composition V Georgieva, A Bogaerts, R Gijbels Journal of applied physics 93 (5), 2369-2379, 2003 | 93 | 2003 |
Simultaneous dissociation of CO2 and H2O to syngas in a surface-wave microwave discharge G Chen, T Silva, V Georgieva, T Godfroid, N Britun, R Snyders, ... International Journal of Hydrogen Energy 40 (9), 3789-3796, 2015 | 90 | 2015 |
Plasma-catalytic conversion of CO2 and CO2/H2O in a surface-wave sustained microwave discharge Guoxing Chen, Thomas Godfroid, Nikolay Britun, Violeta Georgieva, Marie ... Applied Catalysis B: Environmental 214, 114-125, 2017 | 89 | 2017 |
Sputter-deposited Mg–Al–O thin films: linking molecular dynamics simulations to experiments V Georgieva, M Saraiva, N Jehanathan, OI Lebelev, D Depla, A Bogaerts Journal of Physics D: Applied Physics 42 (6), 065107, 2009 | 51 | 2009 |
Understanding Microwave Surface‐Wave Sustained Plasmas at Intermediate Pressure by 2D Modeling and Experiments V Georgieva, A Berthelot, T Silva, S Kolev, W Graef, N Britun, G Chen, ... Plasma Processes and Polymers 14 (4-5), 1600185, 2017 | 43 | 2017 |
Compositional effects on the growth of Mg (M) O films M Saraiva, V Georgieva, S Mahieu, K Van Aeken, A Bogaerts, D Depla Journal of Applied Physics 107 (3), 2010 | 43 | 2010 |
Study of the nucleation and growth of TiO2 and ZnO thin films by means of molecular dynamics simulations N Baguer, V Georgieva, L Calderin, IT Todorov, S Van Gils, A Bogaerts Journal of crystal growth 311 (16), 4034-4043, 2009 | 41 | 2009 |
Computer modeling of plasmas and plasma‐surface interactions A Bogaerts, E Bultinck, M Eckert, V Georgieva, M Mao, E Neyts, ... Plasma Processes and Polymers 6 (5), 295-307, 2009 | 41 | 2009 |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model V Georgieva, A Bogaerts Plasma Sources Science and Technology 15 (3), 368, 2006 | 38 | 2006 |
Understanding the surface diffusion processes during magnetron sputter-deposition of complex oxide Mg–Al–O thin films V Georgieva, AF Voter, A Bogaerts Crystal growth & design 11 (6), 2553-2558, 2011 | 28 | 2011 |
Modeling of the plasma chemistry and plasma–surface interactions in reactive plasmas A Bogaerts, C De Bie, M Eckert, V Georgieva, T Martens, E Neyts, S Tinck Pure and Applied Chemistry 82 (6), 1283-1299, 2010 | 23 | 2010 |
Molecular dynamics simulation of oxide thin film growth: Importance of the inter-atomic interaction potential V Georgieva, IT Todorov, A Bogaerts Chemical Physics Letters 485 (4-6), 315-319, 2010 | 21 | 2010 |
Computer simulations for processing plasmas A Bogaerts, K De Bleecker, V Georgieva, I Kolev, M Madani, E Neyts Plasma Processes and Polymers 3 (2), 110-119, 2006 | 16 | 2006 |
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering M Saraiva, H Chen, WP Leroy, S Mahieu, N Jehanathan, O Lebedev, ... Plasma Processes and Polymers 6 (S1), S751-S754, 2009 | 14 | 2009 |
Negative ion behavior in single-and dual-frequency plasma etching reactors: Particle-in-cell/Monte Carlo collision study V Georgieva, A Bogaerts Physical Review E 73 (3), 036402, 2006 | 13 | 2006 |