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Co-authors
- Raymond J.E. HuetingAssociate professor, University of TwenteVerified email at utwente.nl
- V Ramgopal Rao, Fellow of IEEE, TW...IIT Bombay/IIT DelhiVerified email at ee.iitb.ac.in
- Luca De MichielisEPFL - Swiss Federal Institute of Technology - LausanneVerified email at iis.ee.ethz.ch
- Sourish BanerjeeimecVerified email at imec.be
- Elizabeth BuitragoHitachi EnergyVerified email at hitachienergy.com
- Vijay S PalaparthyStaff Engineer AMD, PhD IIT BombayVerified email at ee.iitb.ac.in
- Soumyo MukherjiIIT BombayVerified email at iitb.ac.in
- Maryam Shojaei BaghiniProfessor of Electrical Engineering, IIT-BombayVerified email at iitb.ac.in
- Lis NanverVerified email at utwente.nl
- Ambarish GhoshIndian Institute of Science, BangaloreVerified email at iisc.ac.in
- Arijit GhoshProcess development engineer, Lithography, Intel CorporationVerified email at intel.com
- Pooyath Lekshmy VenugopalanFulbright Fellow, Department of Nanoengineering, University of California, San DiegoVerified email at eng.ucsd.edu
- Jurriaan SchmitzMESA+ Institute for Nanotechnology, University of TwenteVerified email at utwente.nl
- Alexey KovalginAssociate Professor, University of Twente, Enschede, NLVerified email at utwente.nl
- Shivakumar D ThammaiahResearch Project Associate at Indian Institute of Science, BengaluruVerified email at iisc.ac.in
- Greshma NairProcess Specialist, Avalon Holographics