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| Optimization of pitch-split double patterning phoresist for applications at the 16nm node SJ Holmes, C Tang, S Burns, Y Yin, R Chen, C Koay, S Kini, H Tomizawa, ... 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 1-8, 2011 | 11 | 2011 |
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| Defectivity modulation in EUV resists through advanced filtration technologies L D'Urzo, T Umeda, T Mizuno, A Hattori, R Varanasi, A Singh, R Beera, ... Advances in Patterning Materials and Processes XXXVII 11326, 99-105, 2020 | 6 | 2020 |
| Enhanced cleaning for the point-of-use filter and its effectiveness on wafer defectivity in immersion ArF lithography process R Varanasi, T Umeda, M Mesawich, P Connor, L Johnson Journal of photopolymer science and technology 30 (6), 639-643, 2017 | 5 | 2017 |
| Advanced lithographic filtration and contamination control for 14nm node and beyond semiconductor processes R Varanasi, M Mesawich, P Connor, L Johnson Advances in Patterning Materials and Processes XXXIV 10146, 462-468, 2017 | 4 | 2017 |
| Functionalized fused thiophenes: a new class of thermally stable and efficient second-order nonlinear optical chromophores V Pushkara Rao, KY Wong, AKY Jen, KJ Drost Chemistry of Materials 6 (12), 2210-2212, 1994 | 3 | 1994 |
| Defect mitigation and characterization in silicon hardmask materials V Alexander, S Paudel, G Dado, L D'Urzo, V Briggs, M Bavarian, ... Advances in Patterning Materials and Processes XXXVII 11326, 324-334, 2020 | 2 | 2020 |
| Metal reduction at point-of-use filtration T Umeda, S Daikoku, R Varanasi, S Tsuzuki Advances in Patterning Materials and Processes XXXIII 9779, 264-269, 2016 | 2 | 2016 |
| Fabrication of dual damascene BEOL structures using a multilevel multiple exposure (MLME) scheme, part 2: RIE-based pattern transfer and completion of dual damascene process … S Harrer, JC Arnold, DL Goldfarb, SJ Holmes, R Chen, C Tang, M Slezak, ... Advances in Resist Materials and Processing Technology XXVII 7639, 397-408, 2010 | 2 | 2010 |
| Process characterization of pitch-split resist materials for application at 16nm node SJ Holmes, C Tang, JC Arnold, Y Yin, R Chen, N Fender, B Osborn, ... Advances in Resist Materials and Processing Technology XXVII 7639, 867-876, 2010 | 2 | 2010 |
| BEOL lithography for early development at the 65-nm node R DellaGuardia, RW Kwong, W Li, P Lawson, M Burkhardt, IC Grauer, ... Optical Microlithography XVII 5377, 980-987, 2004 | 2 | 2004 |
| Novel push-pull thiophenes for second order nonlinear optical applicatoins V Pushkara Rao, AKY JEN, KY Wong, KJ Drost Tetrahedron letters 34 (11), 1747-1750, 1993 | 2 | 1993 |
| Characterization of sub-10 nm filter cleanliness by electrophoretic purification and analysis MM Payne, R Varanasi, GW Wildermuth, AJ Ackermann 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2018 | | 2018 |
| An ultrasensitive bio-surrogate for nanoporous filter membrane performance metrology directed towards contamination control in microlithography applications F Ahmad, B Mish, J Qiu, A Singh, R Varanasi, E Bedford, M Smith Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | | 2016 |
| 14nm ノード以降の半導体プロセスにおける先端リソグラフィ材料のろ過とコンタミネーション・コントロール R Varanasi, M Mesawich, P Connor, L Johnson | | |
