Kenneth A. Goldberg
Kenneth A. Goldberg
Optical Physicist, Lawrence Berkeley National Laboratory; Advanced Light Source (ALS) & ALS-U
Verified email at lbl.gov - Homepage
TitleCited byYear
Phase-shifting point diffraction interferometer
H Medecki, E Tejnil, KA Goldberg, J Bokor
Optics letters 21 (19), 1526-1528, 1996
1781996
Fourier-transform method of phase-shift determination
KA Goldberg, J Bokor
Applied optics 40 (17), 2886-2894, 2001
1402001
Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy
PP Naulleau, KA Goldberg, SH Lee, C Chang, D Attwood, J Bokor
Applied Optics 38 (35), 7252-7263, 1999
1231999
Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
P Naulleau, KA Goldberg, EH Anderson, K Bradley, R Delano, P Denham, ...
Emerging Lithographic Technologies VIII 5374, 881-891, 2004
1082004
Hartmann wave-front measurement at 13.4 nm with λ EUV/120 accuracy
P Mercère, P Zeitoun, M Idir, S Le Pape, D Douillet, X Levecq, G Dovillaire, ...
Optics letters 28 (17), 1534-1536, 2003
972003
Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography
PP Naulleau, KA Goldberg, P Batson, J Bokor, P Denham, S Rekawa
Applied Optics 42 (5), 820-826, 2003
832003
Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system
PP Naulleau, KA Goldberg, J Bokor
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
812000
EUV engineering test stand
DA Tichenor, GD Kubiak, WC Replogle, LE Klebanoff, JB Wronosky, ...
Emerging Lithographic Technologies IV 3997, 48-69, 2000
782000
Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions
DT Attwood, P Naulleau, KA Goldberg, E Tejnil, C Chang, R Beguiristain, ...
IEEE Journal of Quantum Electronics 35 (5), 709-720, 1999
701999
System integration and performance of the EUV engineering test stand
DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ...
Emerging Lithographic Technologies V 4343, 19-37, 2001
682001
At-wavelength interferometry for extreme ultraviolet lithography
E Tejnil, KA Goldberg, SH Lee, H Medecki, PJ Batson, PE Denham, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1997
681997
Critical challenges for EUV resist materials
PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ...
Advances in Resist Materials and Processing Technology XXVIII 7972, 797202, 2011
652011
Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements
KA Goldberg, A Barty, Y Liu, P Kearney, Y Tezuka, T Terasawa, JS Taylor, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
652006
Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination
F Brizuela, Y Wang, CA Brewer, F Pedaci, W Chao, EH Anderson, Y Liu, ...
Optics letters 34 (3), 271-273, 2009
622009
Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
PP Naulleau, KA Goldberg, SH Lee, CHC Chang, CJ Bresloff, PJ Batson, ...
Emerging Lithographic Technologies II 3331, 114-123, 1998
581998
EUV microexposures at the ALS using the 0.3-NA MET projection optics
P Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, B Hoef, ...
Emerging Lithographic Technologies IX 5751, 56-63, 2005
572005
Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic
P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
562002
At-wavelength alignment and testing of the 0.3 NA MET optic
KA Goldberg, PP Naulleau, PE Denham, SB Rekawa, K Jackson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
552004
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic
PP Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, K Jackson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
552004
EUV scattering and flare of 10x projection cameras
EM Gullikson, SL Baker, JE Bjorkholm, J Bokor, KA Goldberg, ...
Emerging Lithographic Technologies III 3676, 717-723, 1999
531999
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Articles 1–20