Mari Napari
Mari Napari
Research Fellow, Zepler Institute for Photonics and Nanoelectronics, University of Southampton
Verified email at soton.ac.uk
Title
Cited by
Cited by
Year
Towards oxide electronics: a roadmap
M Coll, J Fontcuberta, M Althammer, M Bibes, H Boschker, A Calleja, ...
Applied surface science 482, 1-93, 2019
972019
Nucleation and growth of ZnO on PMMA by low-temperature atomic layer deposition
M Napari, J Malm, R Lehto, J Julin, K Arstila, T Sajavaara, M Lahtinen
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 33 (1 …, 2015
252015
Transition-edge sensors for particle induced X-ray emission measurements
MRJ Palosaari, KM Kinnunen, J Julin, M Laitinen, M Napari, T Sajavaara, ...
Journal of Low Temperature Physics 176 (3-4), 285-290, 2014
222014
Highly textured Gd2Zr2O7 films grown on textured Ni-5 at.% W substrates by solution deposition route: Growth, texture evolution, and microstructure dependency
Y Zhao, JC Grivel, M Napari, D Pavlopoulos, J Bednarčík, ...
Thin Solid Films 520 (6), 1965-1972, 2012
192012
Atomic layer deposition of functional multicomponent oxides
M Coll, M Napari
APL Materials 7 (11), 110901, 2019
132019
Bandgap lowering in mixed alloys of Cs 2 Ag (Sb x Bi 1− x) Br 6 double perovskite thin films
Z Li, SR Kavanagh, M Napari, RG Palgrave, M Abdi-Jalebi, ...
Journal of Materials Chemistry A 8 (41), 21780-21788, 2020
72020
Lithographic fabrication of soda-lime glass based microfluidics
L Rojas, R Norarat, M Napari, H Kivistö, O Chienthavorn, HJ Whitlow
Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2013
72013
Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
M Napari, M Lahtinen, A Veselov, J Julin, E Østreng, T Sajavaara
Surface and Coatings Technology 326, 281-290, 2017
62017
Development of a microfluidic design for an automatic lab-on-chip operation
N Puttaraksa, HJ Whitlow, M Napari, L Meriläinen, L Gilbert
Microfluidics and Nanofluidics 20 (10), 142, 2016
62016
High speed microfluidic prototyping by programmable proximity aperture MeV ion beam lithography
N Puttaraksa, M Napari, L Meriläinen, HJ Whitlow, T Sajavaara, L Gilbert
Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2013
52013
Why are hydrogen ions best for MeV ion beam lithography?
R Norarat, N Puttaraksa, M Napari, ARA Sagari, M Laitinen, T Sajavaara, ...
Microelectronic engineering 102, 22-24, 2013
52013
Direct writing of channels for microfluidics in silica by MeV ion beam lithography
N Puttaraksa, M Napari, O Chienthavorn, R Norarat, T Sajavaara, ...
Advanced Materials Research 254, 132-135, 2011
52011
Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films
M Napari, TN Huq, T Maity, D Gomersall, KM Niang, A Barthel, ...
InfoMat 2 (4), 769-774, 2020
42020
The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2–N2 capacitive discharges
M Napari, O Tarvainen, S Kinnunen, K Arstila, J Julin, ØS Fjellvåg, ...
Journal of Physics D: Applied Physics 50 (9), 095201, 2017
42017
Rapid Vapor-Phase Deposition of High-Mobility p-Type Buffer Layers on Perovskite Photovoltaics for Efficient Semitransparent Devices
RA Jagt, TN Huq, SA Hill, M Thway, T Liu, M Napari, B Roose, ...
ACS Energy Letters 5 (8), 2456-2465, 2020
22020
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
M Napari
Research report/Department of Physics, University of Jyväskylä, 2017
22017
Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications
M Napari, TN Huq, RLZ Hoye, JL MacManus‐Driscoll
InfoMat, 2020
12020
Development of procedures for programmable proximity aperture lithography
HJ Whitlow, S Gorelick, N Puttaraksa, M Napari, MJ Hokkanen, R Norarat
Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2013
12013
Role of ALD Al2O3 surface passivation on the performance of p-type Cu2O thin film transistors
M Napari, TN Huq, DJ Meeth, MJ Heikkilä, KM Niang, H Wang, T Iivonen, ...
arXiv preprint arXiv:2010.10928, 2020
2020
Atomic scale surface modification of TiO 2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
JWF Innocent, M Napari, AL Johnson, TR Harris-Lee, M Regue, ...
Materials Advances, 2020
2020
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