Vassilios Constantoudis
Vassilios Constantoudis
Researcher, NCSR Demokritos
Verified email at inn.demokritos.gr
Title
Cited by
Cited by
Year
Quantification of line-edge roughness of photoresists. II. Scaling and fractal analysis and the best roughness descriptors
V Constantoudis, GP Patsis, A Tserepi, E Gogolides
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
1412003
Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions
V Constantoudis, GP Patsis, LHA Leunissen, E Gogolides
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
1232004
Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials
E Gogolides, V Constantoudis, G Kokkoris, D Kontziampasis, K Tsougeni, ...
Journal of Physics D: Applied Physics 44 (17), 174021, 2011
1102011
Control of Nanotexture and Wetting Properties of Polydimethylsiloxane from Very Hydrophobic to Super‐Hydrophobic by Plasma Processing
K Tsougeni, A Tserepi, G Boulousis, V Constantoudis, E Gogolides
Plasma Processes and Polymers 4 (4), 398-405, 2007
1102007
Hyperacceleration in a stochastic Fermi-Ulam model
AK Karlis, PK Papachristou, FK Diakonos, V Constantoudis, ...
Physical review letters 97 (19), 194102, 2006
1102006
A review of line edge roughness and surface nanotexture resulting from patterning processes
E Gogolides, V Constantoudis, GP Patsis, A Tserepi
Microelectronic Engineering 83 (4-9), 1067-1072, 2006
1002006
Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
GP Patsis, V Constantoudis, A Tserepi, E Gogolides, G Grozev
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
962003
Fermi acceleration in the randomized driven Lorentz gas and the Fermi-Ulam model
AK Karlis, PK Papachristou, FK Diakonos, V Constantoudis, ...
Physical Review E 76 (1), 016214, 2007
672007
Tailoring the surface topography and wetting properties of oxygen-plasma treated polydimethylsiloxane
A Tserepi, E Gogolides, K Tsougeni, V Constantoudis, ES Valamontes
Journal of applied physics 98 (11), 113502, 2005
672005
Solution processable tungsten polyoxometalate as highly effective cathode interlayer for improved efficiency and stability polymer solar cells
LC Palilis, M Vasilopoulou, AM Douvas, DG Georgiadou, S Kennou, ...
Solar energy materials and solar cells 114, 205-213, 2013
642013
Plasma nanotextured PMMA surfaces for protein arrays: increased protein binding and enhanced detection sensitivity
K Tsougeni, A Tserepi, V Constantoudis, E Gogolides, PS Petrou, ...
Langmuir 26 (17), 13883-13891, 2010
602010
Effects of photoresist polymer molecular weight on line-edge roughness and its metrology probed with Monte Carlo simulations
GP Patsis, V Constantoudis, E Gogolides
Microelectronic engineering 75 (3), 297-308, 2004
602004
Dual nanoscale roughness on plasma-etched Si surfaces: Role of etch inhibitors
G Kokkoris, V Constantoudis, P Angelikopoulos, G Boulousis, ...
Physical Review B 76 (19), 193405, 2007
582007
Plasma nanotextured polymeric lab-on-a-chip for highly efficient bacteria capture and lysis
K Tsougeni, G Papadakis, M Gianneli, A Grammoustianou, ...
Lab on a Chip 16 (1), 120-131, 2016
572016
Porphyrin oriented self-assembled nanostructures for efficient exciton dissociation in high-performing organic photovoltaics
M Vasilopoulou, DG Georgiadou, AM Douvas, A Soultati, V Constantoudis, ...
Journal of Materials Chemistry A 2 (1), 182-192, 2014
542014
Photoresist line-edge roughness analysis using scaling concepts
V Constantoudis, GP Patsis, E Gogolides
Journal of Micro/Nanolithography, MEMS, and MOEMS 3 (3), 429-435, 2004
522004
Plasma directed assembly and organization: bottom-up nanopatterning using top-down technology
N Vourdas, D Kontziampasis, G Kokkoris, V Constantoudis, A Goodyear, ...
Nanotechnology 21 (8), 085302, 2010
512010
Effects on surface morphology of epitaxial Y2O3 layers on Si (001) after postgrowth annealing
V Ioannou-Sougleridis, V Constantoudis, M Alexe, R Scholz, G Vellianitis, ...
Thin Solid Films 468 (1-2), 303-309, 2004
502004
Si etching in high-density SF6 plasmas for microfabrication: surface roughness formation
E Gogolides, C Boukouras, G Kokkoris, O Brani, A Tserepi, ...
Microelectronic engineering 73, 312-318, 2004
502004
Need for LWR metrology standardization: the imec roughness protocol
GF Lorusso, T Sutani, V Rutigliani, F Van Roey, A Moussa, AL Charley, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 041009, 2018
492018
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