| Comparison of Al–Si–N nanocomposite coatings deposited by HIPIMS and DC magnetron sputtering E Lewin, D Loch, A Montagne, AP Ehiasarian, J Patscheider Surface and coatings technology 232, 680-689, 2013 | 88 | 2013 |
| Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films PE Hovsepian, AA Sugumaran, Y Purandare, DAL Loch, AP Ehiasarian Thin solid films 562, 132-139, 2014 | 52 | 2014 |
| Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique B Biswas, Y Purandare, AA Sugumaran, DAL Loch, S Creasey, I Khan, ... Thin Solid Films 636, 558-566, 2017 | 19 | 2017 |
| Complementary metal–oxide–semiconductor compatible deposition of nanoscale transition-metal nitride thin films for plasmonic applications R Bower, DAL Loch, E Ware, A Berenov, B Zou, PE Hovsepian, ... ACS Applied Materials & Interfaces 12 (40), 45444-45452, 2020 | 11 | 2020 |
| Study of the effect of RF-power and process pressure on the morphology of copper and titanium sputtered by ICIS DAL Loch, AP Ehiasarian Surface and coatings technology 327, 200-206, 2017 | 11 | 2017 |
| Nickel coatings by inductively coupled impulse sputtering (ICIS) DAL Loch, YA Gonzalvo, AP Ehiasarian Surface and coatings technology 267, 98-104, 2015 | 9 | 2015 |
| Electrodeposition of ternary compounds for novel PV application and optimisation of electrodeposited CdMnTe thin-films AE Alam, OI Olusola, DAL Loch, K Shukla, WM Cranton, IM Dharmadasa Scientific Reports 10 (1), 21445, 2020 | 8 | 2020 |
| A novel sputtering technique: inductively coupled impulse sputtering (ICIS) DAL Loch, AP Ehiasarian IOP Conference Series: Materials Science and Engineering 39 (1), 012006, 2012 | 7 | 2012 |
| Plasma analysis of inductively coupled impulse sputtering of Cu, Ti and Ni DAL Loch, YA Gonzalvo, AP Ehiasarian Plasma Sources Science and Technology 26 (6), 065012, 2017 | 4 | 2017 |
| Reactive sputter deposition of alumina coatings H Gerdes, R Bandorf, D Loch, G Bräuer IOP Conference Series: Materials Science and Engineering 39 (1), 012009, 2012 | 3 | 2012 |
| A new approach towards performing plasma nitriding of CrCoMo medical grade alloys using HIPIMS discharge K Shukla, Y Purandare, A Sugumaran, D Loch, A Ehiasarian, I Khan, ... 64th Annual Technical Conference Proceedings, 2021 | 1 | 2021 |
| Low-Pressure Plasma Nitriding Of Medical Grade Alloy Using HIPIMS Discharge K Shukla, Y Purandare, D Loch, A Sugumaran, I Kahn, A Ehiasarian, ... | | 2020 |
| Transition metal nitride thin films deposited at CMOS compatible temperatures for tunable optoelectronic and plasmonic devices R Bower, DAL Loch, A Berenov, B Zou, PE Hovsepian, AP Ehiasarian, ... arXiv preprint arXiv:2005.05185, 2020 | | 2020 |
| Development of an inductively coupled impulse sputtering source for coating deposition DAL Loch PQDT-Global, 2015 | | 2015 |
| Reactive Sputter Deposition of Alumina Coatings R Bandorf, D Loch, G Bräuer IOP Conference Series. Materials Science and Engineering 39 (1), 2012 | | 2012 |
| Study of the ionisation in a nickel plasma by Inductively Coupled Impulse Sputtering (ICIS) DAL Loch, AP Ehiasarian International Conference on Plasma Surface Engineering 2 (13), 108-111, 2012 | | 2012 |
| Highly ionised gas-flow sputtering R Bandorf, D Loch, G Bräuer | | 2011 |
| Hard and optically transparent Al-Si-N nanocomposites deposited with HIPIMS and DCMS E Lewin, D Loch, AP Ehiasarian, J Patscheider RSD 2011, 2011 | | 2011 |
| Inductively Coupled Impulse Sputtering-A novel Technology for Ionised PVD AP Ehiasarian, DAL Loch | | |
| CMOS compatible deposition of nanoscale transition metal nitride thin films for plasmonic applications R Bower, DAL Loch, E Ware, A Berenov, B Zou, P Eh | | |
Joerg PatscheiderEvatec AGVerified email at evatecnet.com
