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Vikrant Rai
Vikrant Rai
Colorado School of Mines
Verified email at lamresearch.com
Title
Cited by
Cited by
Year
Surface reaction mechanisms during ozone and oxygen plasma assisted atomic layer deposition of aluminum oxide
VR Rai, V Vandalon, S Agarwal
Langmuir 26 (17), 13732-13735, 2010
1132010
Surface reaction mechanisms during plasma-assisted atomic layer deposition of titanium dioxide
VR Rai, S Agarwal
The Journal of Physical Chemistry C 113 (30), 12962-12965, 2009
752009
Influence of surface temperature on the mechanism of atomic layer deposition of aluminum oxide using an oxygen plasma and ozone
VR Rai, V Vandalon, S Agarwal
Langmuir 28 (1), 350-357, 2012
732012
Surface reaction mechanisms during ozone-based atomic layer deposition of titanium dioxide
VR Rai, S Agarwal
The Journal of Physical Chemistry C 112 (26), 9552-9554, 2008
712008
Mechanism of self-catalytic atomic layer deposition of silicon dioxide using 3-aminopropyl triethoxysilane, water, and ozone
VR Rai, S Agarwal
Chemistry of Materials 23 (9), 2312-2316, 2011
542011
In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
VR Rai, S Agarwal
Journal of Vacuum Science & Technology A 30 (1), 2012
382012
Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
RP Chaukulkar, NFW Thissen, VR Rai, S Agarwal
Journal of Vacuum Science & Technology A 32 (1), 2014
192014
Study of surface reactions during atomic layer deposition using in situ infrared spectroscopy
RP Chaukulkar, N Thissen, VR Rai, S Agarwal
Abstracts of Papers of the American Chemical Society 242, 2011
12011
Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Isopropoxide and Ozone
V Rai, S Agarwal
ECS Meeting Abstracts, 775, 2008
12008
Investigation of gas-surface interactions during atomic layer deposition
VR Rai
2011-Mines Theses & Dissertations, 2011
2011
Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetraisopropoxide and Ozone
S Agarwal, VR Rai
The 2008 Annual Meeting, 2008
2008
LOW TEMPERATURE HYDROGEN PLASMA-ASSISTED ATOMIC LAYER DEPOSITION OF COPPER STUDIED USING IN SITU INFRARED REFLECTION ABSORPTION SPECTROSCOPY
RPCNFW Thissen, VR Rai, S Agarwal
ENGINEERING THE SURFACES OF GROUP IV MATERIALS FOR ENERGY APPLICATIONS 1001, 117, 0
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