A CMOS silicon spin qubit R Maurand, X Jehl, D Kotekar-Patil, A Corna, H Bohuslavskyi, R Laviéville, ... Nature communications 7 (1), 13575, 2016 | 654 | 2016 |
Advances, challenges and opportunities in 3D CMOS sequential integration P Batude, M Vinet, B Previtali, C Tabone, C Xu, J Mazurier, O Weber, ... 2011 International Electron Devices Meeting, 7.3. 1-7.3. 4, 2011 | 415 | 2011 |
Advances in 3D CMOS sequential integration P Batude, M Vinet, A Pouydebasque, C Le Royer, B Previtali, C Tabone, ... 2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009 | 394 | 2009 |
Planar Fully depleted SOI technology: A Powerful architecture for the 20nm node and beyond O Faynot, F Andrieu, O Weber, C Fenouillet-Béranger, P Perreau, ... 2010 International Electron Devices Meeting, 3.2. 1-3.2. 4, 2010 | 330 | 2010 |
3D monolithic integration: Technological challenges and electrical results M Vinet, P Batude, C Tabone, B Previtali, C LeRoyer, A Pouydebasque, ... Microelectronic Engineering 88 (4), 331-335, 2011 | 324 | 2011 |
22nm FDSOI technology for emerging mobile, Internet-of-Things, and RF applications R Carter, J Mazurier, L Pirro, JU Sachse, P Baars, J Faul, C Grass, ... 2016 IEEE International Electron Devices Meeting (IEDM), 2.2. 1-2.2. 4, 2016 | 316 | 2016 |
Single-donor ionization energies in a nanoscale CMOS channel M Pierre, R Wacquez, X Jehl, M Sanquer, M Vinet, O Cueto Nature nanotechnology 5 (2), 133-137, 2010 | 299 | 2010 |
Setting up 3D sequential integration for back-illuminated CMOS image sensors with highly miniaturized pixels with low temperature fully depleted SOI transistors P Coudrain, P Batude, X Gagnard, C Leyris, S Ricq, M Vinet, ... 2008 IEEE International Electron Devices Meeting, 1-4, 2008 | 276 | 2008 |
Demonstration of low temperature 3D sequential FDSOI integration down to 50 nm gate length P Batude, M Vinet, C Xu, B Previtali, C Tabone, C Le Royer, L Sanchez, ... 2011 Symposium on VLSI Technology-Digest of Technical Papers, 158-159, 2011 | 273 | 2011 |
3D monolithic integration P Batude, M Vinet, A Pouydebasque, C Le Royer, B Previtali, C Tabone, ... 2011 IEEE International Symposium of Circuits and Systems (ISCAS), 2233-2236, 2011 | 261 | 2011 |
Circuit with transistors integrated in three dimensions and having a dynamically adjustable threshold voltage VT P Batude, L Clavelier, MA Jaud, O Thomas, M Vinet US Patent 8,183,630, 2012 | 253 | 2012 |
Multi-UTBB FDSOI Device Architectures for Low-Power CMOS Circuit JP Noel, O Thomas, MA Jaud, O Weber, T Poiroux, C Fenouillet-Beranger, ... IEEE Transactions on Electron Devices 58 (8), 2473-2482, 2011 | 235 | 2011 |
SRAM memory cell having transistors integrated at several levels and the threshold voltage VT of which is dynamically adjustable O Thomas, P Batude, A Pouydebasque, M Vinet US Patent 8,013,399, 2011 | 233 | 2011 |
Germanium on Insulator and new 3D architectures opportunities for integration M Vinet, C Le Royer, P Batude, JF Damlencourt, JM Hartmann, L Hutin, ... International Journal of Nanotechnology 7 (4-8), 304-319, 2010 | 220 | 2010 |
Scaling silicon-based quantum computing using CMOS technology MF Gonzalez-Zalba, S De Franceschi, E Charbon, T Meunier, M Vinet, ... Nature Electronics 4 (12), 872-884, 2021 | 211 | 2021 |
Integrated circuit with electrostatically coupled MOS transistors and method for producing such an integrated circuit E Augendre, M Vinet, L Clavelier, P Batude US Patent 8,853,785, 2014 | 210 | 2014 |
The future transistors W Cao, H Bu, M Vinet, M Cao, S Takagi, S Hwang, T Ghani, K Banerjee Nature 620 (7974), 501-515, 2023 | 173 | 2023 |
Multiple gate devices: advantages and challenges T Poiroux, M Vinet, O Faynot, J Widiez, J Lolivier, T Ernst, B Previtali, ... Microelectronic Engineering 80, 378-385, 2005 | 162 | 2005 |
Gate-reflectometry dispersive readout and coherent control of a spin qubit in silicon A Crippa, R Ezzouch, A Aprá, A Amisse, R Lavieville, L Hutin, B Bertrand, ... Nature communications 10 (1), 2776, 2019 | 152 | 2019 |
Bonded planar double-metal-gate NMOS transistors down to 10 nm M Vinet, T Poiroux, J Widiez, J Lolivier, B Previtali, C Vizioz, B Guillaumot, ... IEEE Electron Device Letters 26 (5), 317-319, 2005 | 152 | 2005 |