| Power variability in contemporary DRAMs M Gottscho, AA Kagalwalla, P Gupta IEEE Embedded Systems Letters 4 (2), 37-40, 2012 | 29 | 2012 |
| Design-aware defect-avoidance floorplanning of EUV masks AA Kagalwalla, P Gupta IEEE Transactions on Semiconductor Manufacturing 26 (1), 111-124, 2012 | 19 | 2012 |
| Defect-aware reticle floorplanning for EUV masks AA Kagalwalla, P Gupta, DH Hur, CH Park Design for Manufacturability through Design-Process Integration V 7974, 285-294, 2011 | 16 | 2011 |
| Design-aware mask inspection AA Kagalwalla, P Gupta, CJ Progler, S McDonald IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2012 | 11 | 2012 |
| Measurement and optimization of electrical process window AA Kagalwalla, 3 Puneet Journal of Micro/Nanolithography, MEMS and MOEMS 10 (1), 013014-013014-14, 2011 | 11* | 2011 |
| Design-aware mask inspection SMD Abde Ali Kagalwalla, Puneet Gupta, Chris Progler International Conference on Computer-Aided Design (ICCAD), 93-99, 2010 | 11* | 2010 |
| Benchmarking of mask fracturing heuristics TB Chan, P Gupta, K Han, AA Kagalwalla, AB Kahng IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2016 | 10 | 2016 |
| Comprehensive defect avoidance framework for mitigating EUV mask defects AA Kagalwalla, P Gupta Extreme Ultraviolet (EUV) Lithography V 9048, 212-222, 2014 | 9 | 2014 |
| EUV-CDA: Pattern shift aware critical density analysis for EUV mask layouts AA Kagalwalla, M Lam, K Adam, P Gupta 2014 19th Asia and South Pacific Design Automation Conference (ASP-DAC), 155-160, 2014 | 7 | 2014 |
| Comprehensive defect avoidance framework for mitigating extreme ultraviolet mask defects AA Kagalwalla, P Gupta Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (4), 043005-043005, 2014 | 6 | 2014 |
| Analyzing power variability of DDR3 dual inline memory modules M Gottscho, P Gupta, AA Kagalwalla University of California, Los Angeles, Tech. Rep, 2011 | 6 | 2011 |
| Methods for analyzing design rules S Muddu, AA Kagalwalla, L Capodieci US Patent 8,589,844, 2013 | 5 | 2013 |
| Effective model-based mask fracturing for mask cost reduction AA Kagalwalla, P Gupta Proceedings of the 52nd Annual Design Automation Conference, 1-6, 2015 | 4 | 2015 |
| Systems and methods for per-cluster intensity correction and base calling EJ Ojard, AAH Kagalwalla, R Mehio, N Udpa, GD Parnaby, JS Vieceli US Patent 11,361,194, 2022 | 2 | 2022 |
| Computational Methods for Design-Assisted Mask Flows AAH Kagalwalla University of California, Los Angeles, 2014 | 2 | 2014 |
| Design-of-experiments based design rule optimization AA Kagalwalla, S Muddu, L Capodieci, C Zelnik, P Gupta Design for Manufacturability through Design-Process Integration VI 8327, 83-90, 2012 | 2 | 2012 |
| Image morphing to meet desired constraints in geometric patterns B Baidya, H Erten, A Gu, JA Swanson, VK Singh, AAH Kagalwalla, ... US Patent 11,301,982, 2022 | 1 | 2022 |
| Iterative supervised identification of non-dominant clusters B Baidya, A Gu, VK Singh, K Sastry, AAH Kagalwalla US Patent 11,176,658, 2021 | 1 | 2021 |
| Semantic pattern extraction from continuous itemsets B Baidya, VK Singh, A Gu, AAH Kagalwalla, S Mukhopadhyay, K Sastry, ... US Patent 10,915,691, 2021 | 1 | 2021 |
| Inter-cluster intensity variation correction and base calling EJ Ojard, AAH Kagalwalla, R Mehio, N Udpa, GD Parnaby, JS Vieceli US Patent 11,853,396, 2023 | | 2023 |
Mark GottschoSambaNova SystemsVerified email at ucla.edu
